The Study of Specific Materials Used by the Copper Wiring CMP of GLSI

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In this paper, the multi-hydroxyl polyamines researched by ourselves are used in the slurry of the copper wiring CMP of GLSI, which makes the slurry alkalization. It also has the using as a pH adjusting agent, complexion agent of copper ion, multi- metal chelating agents, aminating agent of acidic oxides, pH buffer, stainless steel corrosion inhibitor, the active agent and pro-oxidant. It improves the property of slurry and solves many different of acidity slurry. The alkalinity slurry contained the multi-hydroxyl polyamines is environmental, inexpensive and composition- simplified. Without the toxic BTA which is must be used in the international and has side effect, the slurry can achieve the high speed and high flat. In the same time the low pressure and the little abrasive can be realized, which provide the new material for the removal of TSV copper film.

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368-371

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February 2013

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© 2013 Trans Tech Publications Ltd. All Rights Reserved

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[1] S. Pandija, D. Roy and S.V. Babu. Clem: submitted to Journal of Microelectronic Engineering (2009).

Google Scholar

[2] J.P. Zheng,D. Roy. Clem: submitted to Journal of Thin Solid Films(2009).

Google Scholar

[3] Liu Yuling, Tan Baimei, and Zhang Kai Leung. Microelectronics Technology and Engineering- materials, process and test( Electronic Industry Press, Beijing 2004).

Google Scholar

[4] W. -S. Lee,S. -Y. Kim,Y. -J. Seo and J.K. Lee, Clem: submitted to Journal of Mater. Sci.: Mater. Electron(2001).

Google Scholar

[5] Feng Q L, TianBao D, Alain D, et al. Cu planarization in electrochemical mechanical planarization, Clem: submitted to Journal of the Electrochemical Society(2006).

Google Scholar

[6] Wang Pengfei, Zhang Wei, Wang Ji Tao. Clem: submitted to Journal of icroelectronics Technology(2000).

Google Scholar

[7] S. -Y. Kim and Y. -J. Clem: submitted to Journal of Microelectron. (2002).

Google Scholar

[8] J.C. Yang, D.W. oh, G.W. Lee, et al. Clem: submitted to Journal of Wear(2010).

Google Scholar

[9] Hara T, Tomisawa T, Kurosu T, et al. Clem: submitted to Journal of Journal of the Electrochemical Society(1999).

Google Scholar