Study on the Accurate Measurement of Film Thickness

Abstract:

The thin-film technology is the hotspot of todays material science research.The thickness is an important physical parameter of the film thickness, so measurement naturally becomes the important work of research into material properties. With the wide application of thin film technology and optoelectronic devices, optical films have been widely used in the weaponary basic research and development and production of special devices. Facing the continuous update and development of weapons and equipment, higher requirements are put forward in precision measuring various parameters of the optical film. The thickness of the film is one of the key parameters in film design and manufacturing process, especially the rapid development of nanoscale thin-film technology, making the accurate measurement of the thickness of the film become a hot issue in the field of thin technology research, and has caused concern of technicians.

• Periodical: Applied Mechanics and Materials (Volumes 313-314)
• Pages: 588-591
• DOI: https://doi.org/10.4028/www.scientific.net/AMM.313-314.588
• Online since: March 2013
• Authors: Zhi Qiang Xu, Kai Guo Qian
• Keywords: Accurate Measurement, Material, Method, Technology, Ultra-Thin Films

References

[1] Shen Weidong, Liu Xu, Zhu Yong, Transmittance Test Curve to Determine the Optical Constants of the Semiconductor Thin Film Thickness [J]. Journal of Semiconductors, 2005, 26 (2): 335-340.

[2] Tang Jin, Peifu Gu. Thin Film Optical Technology [M]. Beijing: China Machine Press, 1989.

[3] Zhang Yinhua, Huang Wei. Several Infrared Optical Characteristics of Thin Film Materials [J]. Optical Instruments, 2006, 28 (4): 104-108.

[4] Fang Rongchuan. Solid Spectroscopy [M]. Hefei: China University of Science and Technology Press 2001.

[5] THIELSCH R. Optical Coatings for the DUV/VUV in Optical Interference Coatings [M]. Springer Series in OpticalSciences, 2003, 88: 257-279.

DOI: 10.1007/978-3-540-36386-6_11

[6] BAKSHI V. EUV Lithography [M]. Bellingham, Washington, SPIE Optical Engineering Press, 2006.

[7] Mai Zhenhong. X-ray Film Structure Characterization [M]. Beijing: Science Press, 2007.

[8] Zhu Hongli. Jin Chunshui, Zhang Lichao. X-ray Diffraction Assembling Error Analysis [J]. Analytical Instruments, 2008 (1): 14-18.

[9] Song Min, Li Boxin, Zheng Yaru. Study of Using Optical Methods for Measuring Film Thickness [j]. Optical Technology, 2004, 30 (1): 103-106.

[10] Fan Xizhi, Li Gang, Zhu Jun. Interference with Extreme Method of Monitoring Organic Electroluminescent Thin Film Thickness [J]. Optical Instruments, 1999, 21 (3): 45-58.

[11] Cheng Hongliang, Wang Zhong, Wu Shaolin. Double Spiral Micrometer Screw Error Compensation and Comprehensive Indication Error [J]. Optical Technology, 1992, 11 (5): 39-43. Design