[1]
Del Castillo, A multivariate self-tuning controller for run-to run process control under shift and trend disturbances, IIE Transactions, Vol. 28 (1996), pp.1011-1021.
DOI: 10.1080/15458830.1996.11770756
Google Scholar
[2]
Ingolfsson, A. and Sacha, E., Stability and Sensitivity of an EWMA Controller, Journal of Quality Technology, Vol. 25, No.4, (1993), pp.271-287.
DOI: 10.1080/00224065.1993.11979473
Google Scholar
[3]
Guo, R. S., Chen, A. and Chen, J. J., Run-to-run control schemes for CMP process subject to deterministic drifts, Semiconductor Manufacturing Technology Workshop, (2000) pp.251-258.
DOI: 10.1109/smtw.2000.883103
Google Scholar
[4]
Jen, C. H., Jiang, B. C. and Fan, S. K. S., General run-to-run (R2R) control framework using self-tuning control for multiple-input multiple-output (MIMO) processes, International Journal of Production Research, Vol. 42, No. 20, (2004), pp.4249-4270.
DOI: 10.1080/00207540410001708498
Google Scholar
[5]
Jiang, B. C., Wang, C. C., Lu, John., Jen, C. H., and Fan, S. K., Using Simulation Techniques to Determine Optimal Operational Region for Multi-Responses Problems, International Journal of Production Research, Vol. 47, No. 12(2009), pp.3219-3230.
DOI: 10.1080/00207540701823227
Google Scholar
[6]
Jiang, B. C., Wang, C. C, Jen, C. H and Wu, M. Y., A Run-to-Run Controller Using Fuzzy Neural Network Techniques for SISO Process, Expert System with Application, Vol. 36, (2009), pp.12044-12048.
DOI: 10.1016/j.eswa.2009.03.011
Google Scholar
[7]
Jiang, B. C., Wang, C. C., Jen, C. H and Luo, L.C., Combining EWMA Control Chart to Reduce Process Control Frequency for Run-to-Run (R2R), Journal of Quality, Vol. 16, No.4, (2009), pp.233-243.
Google Scholar
[8]
Jen, C. H. and Jiang, B. C., Combining On-line Experiment and Process Control Methods for Changes in a Dynamic Model, International Journal of Production Research, Vol. 46, No. 13, 2008, pp.3665-3682.
DOI: 10.1080/00207540601120476
Google Scholar
[9]
Jen, C. H., Jiang, B. C., and Wang, C. C., Integration R2R control schemes and on-line experiment for dealing with the changes in semiconducting dynamic processes, International Journal of Production Research, Vol. 49, (2011), pp.5657-5678.
DOI: 10.1080/00207543.2010.518999
Google Scholar
[10]
Jen, C. H., Lin, K. P., Wu Wen and Chou, C. C., Using LDA with on-line experiment methods for coping with changes in MIMO Dynamic Model, Expert System with Application, Vol. 38 (2011), pp.983-989.
DOI: 10.1016/j.eswa.2010.07.101
Google Scholar
[11]
Masatoshi, N. and Ken, T., Advanced Gate Etching for Accurate CD Control for 130-nm Node ASIC Manufacturing. IEEE Transactions on Semiconductor Manufacturing, Vol. 17, (2004), pp.281-285.
DOI: 10.1109/tsm.2004.831932
Google Scholar
[12]
Patel, N. S. and Jenkins, S. T., Adaptive optimization of run-to-run controllers: the EWMA example, IEEE Transactions on Semiconductor Manufacturing, Vol. 13, No.1 (2000), pp.97-107.
DOI: 10.1109/66.827349
Google Scholar