The Technique of Ion Beam Etching Polishing

Cheng Jun Guo; Ning Pei; Da Sen Wang; Feng Ming Nie; Guang Ping Zhang; Yu Peng Li

doi:10.4028/www.scientific.net/AMM.395-396.1066

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HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vols. 395-396The Technique of Ion Beam Etching Polishing

The Technique of Ion Beam Etching Polishing

Abstract:

The accelerated gas ions collide with the surface material, the atom or molecule on material surface is removed by momentum transferring. Depositing a layer low viscosity of the thin film materials on the original surface of the optical, such materials will form a layer thin film on the surface of optical element that is lower than the original. Remove the high-spatial frequencies and obtain super precision optical surface.

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Periodical:

Applied Mechanics and Materials (Volumes 395-396)

Pages:

1066-1070

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https://doi.org/10.4028/www.scientific.net/AMM.395-396.1066

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Online since:

September 2013

Authors:

Cheng Jun Guo, Ning Pei, Da Sen Wang, Feng Ming Nie, Guang Ping Zhang, Yu Peng Li

Keywords:

Etching, On Beam, Polishing

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