Research of Influence Thickness of Nanocrystalline VOx Films on their Electrical Properties

Oleg Alekseevich Ageev; Evgeny Yurievich Gusev; Evgeny Gennad’evich Zamburg; Alexsander Valer’evich Michailichenko; Vladislav Anatolyevich Gamaleev; Vladislav Vladimirovich Tkachuk

doi:10.4028/www.scientific.net/AMM.475-476.1266

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HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vols. 475-476Research of Influence Thickness of Nanocrystalline...

Research of Influence Thickness of Nanocrystalline VO_x Films on their Electrical Properties

Abstract:

Nanocrystalline VO_x thin films were manufactured by using pulsed laser deposition. The influence of deposition time on electrical parameters of VO_x thin films were researched. It was determined that changes in deposition time lead to significant changes in properties of thin films, including resistivity in the range from 5 Ohm·cm to 70 Ohm·cm. The possibility of controlling physical properties of VO_x nanocrystalline films obtained in the experiments has been shown.

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Periodical:

Applied Mechanics and Materials (Volumes 475-476)

Pages:

1266-1269

DOI:

https://doi.org/10.4028/www.scientific.net/AMM.475-476.1266

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Online since:

December 2013

Authors:

Oleg Alekseevich Ageev, Evgeny Yurievich Gusev*, Evgeny Gennad’evich Zamburg, Alexsander Valer’evich Michailichenko, Vladislav Anatolyevich Gamaleev, Vladislav Vladimirovich Tkachuk

Keywords:

Nanocrystalline Thin Films, Nanomaterial, Nanotechnology, Pulsed Laser Deposition, VO_x

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* - Corresponding Author

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