Nanosheet Films of Schiff Bases Polymer for Micropatterning

Abstract:

A series of novel copolymers [p (AOBHA-co-NPMA)] containing 2-Allyloxy-N-benzylidene hexadecylamine (AOBHA) as film formation material and β-naphtayl methacrylate (NPMA) as photosensitive group were synthesized by free-radical polymerization. The copolymers could form stable condensed monolayer at air/water interface and be transformed onto solid substrates. Positive-tone patterns with the resolution of 0.75 μm of the copolymers Langmuir-Blodgett (LB) films with 35 layers were fabricated by deep UV irradiation, followed by developing with acetone. The etched gold patterns with resolution of 0.75 μm were also obtained, showing that the copolymer has enough resistance to wet etching suitable for fabricating photomask. The mechanism of photolysis was also investigated by UV and GPC, in which showed that the scission of main and side chain of p (AOBHA-co-NPMA) LB films occurred at the same time.

• Periodical: Applied Mechanics and Materials (Volumes 488-489)
• Pages: 260-264
• DOI: https://doi.org/10.4028/www.scientific.net/AMM.488-489.260
• Online since: January 2014
• Authors: Qiu Ling Wang, Yong Na Li, Hui Ying Jia, Yong Ze Wei, Hui Fan Du, Tie Sheng Li*, Wen Jian Xu, Yang Jie Wu, Tokuji Miyashita
• Keywords: Copolymer, Langmuir-Blodgett Films, Photolithography, Schiff Base

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