Deposition of Fluorocarbon Films by RF Magnetron Sputtering at Varying Target-Substrate Distance

Zeng Ji Liu; Quan Ji; Yu Hui Zhang; Yan Zhi Xia

doi:10.4028/www.scientific.net/AMM.50-51.589

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HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vols. 50-51Deposition of Fluorocarbon Films by RF Magnetron...

Deposition of Fluorocarbon Films by RF Magnetron Sputtering at Varying Target-Substrate Distance

Abstract:

The target-substrate distance has a significant effect on the morphology and the relative deposition rate of fluorocarbon films deposited by RF magnetron sputtering. The films were deposited on regenerated cellulose substrate using a polytetrafluoroethylene (PTFE) target, with argon as the working gas. The surface and fracture cross-section morphologies of the deposited films were examined by scanning electron microscopy (SEM). The average thickness of the fluorocarbon films and the relative deposition rates were calculated for varying target-substrate distances. The films had island-like structures composed of nanoscale particles, and the surfaces were not flat. The density of the particles increased and their size decreased with increase of the target-substrate distance in the range 30 to 80 mm. The relative deposition rate increased at first and then decreased with increased target-substrate distance: the optimal target-substrate distance was 50-60 mm.

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Periodical:

Applied Mechanics and Materials (Volumes 50-51)

Pages:

589-593

DOI:

https://doi.org/10.4028/www.scientific.net/AMM.50-51.589

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Online since:

February 2011

Authors:

Zeng Ji Liu, Quan Ji, Yu Hui Zhang, Yan Zhi Xia

Keywords:

Relative Deposition Rate, RF Magnetron Sputtering, Scanning Electron Microscope (SEM), Target Substrate Distance

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