Deposition of Fluorocarbon Films by RF Magnetron Sputtering at Varying Target-Substrate Distance

Abstract:

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The target-substrate distance has a significant effect on the morphology and the relative deposition rate of fluorocarbon films deposited by RF magnetron sputtering. The films were deposited on regenerated cellulose substrate using a polytetrafluoroethylene (PTFE) target, with argon as the working gas. The surface and fracture cross-section morphologies of the deposited films were examined by scanning electron microscopy (SEM). The average thickness of the fluorocarbon films and the relative deposition rates were calculated for varying target-substrate distances. The films had island-like structures composed of nanoscale particles, and the surfaces were not flat. The density of the particles increased and their size decreased with increase of the target-substrate distance in the range 30 to 80 mm. The relative deposition rate increased at first and then decreased with increased target-substrate distance: the optimal target-substrate distance was 50-60 mm.

Info:

Periodical:

Edited by:

Shaobo Zhong, Yimin Cheng and Xilong Qu

Pages:

589-593

DOI:

10.4028/www.scientific.net/AMM.50-51.589

Citation:

Z. J. Liu et al., "Deposition of Fluorocarbon Films by RF Magnetron Sputtering at Varying Target-Substrate Distance", Applied Mechanics and Materials, Vols. 50-51, pp. 589-593, 2011

Online since:

February 2011

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$35.00

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