A Novel Method for Silicon-Beam Fabrication in Wet Etching

Xiang Yong Su; Zhi Sheng Jing; Zhi Yong Cheng; Ze Long Zhou; Bing Jie Zhu

doi:10.4028/www.scientific.net/AMM.536-537.1407

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HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vols. 536-537A Novel Method for Silicon-Beam Fabrication in Wet...

A Novel Method for Silicon-Beam Fabrication in Wet Etching

Abstract:

Fabricating silicon-beam through the wet etching has been developed for many years, there are a lot of advantages during the wet etching, low cost, easy to obtain and so on. However the design and fabrication of silicon-beam with polygon section has been confined during the process of wet etching; In order to fabricate more kinds of silicon-beam with the advantages of the wet etching, a novel method to fabricate silicon-beam with polygon section is proposed. The fabricating process has been designed by taking advantage of the protection effect of the SiO₂ layer.

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Periodical:

Applied Mechanics and Materials (Volumes 536-537)

Pages:

1407-1410

DOI:

https://doi.org/10.4028/www.scientific.net/AMM.536-537.1407

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Online since:

April 2014

Authors:

Xiang Yong Su, Zhi Sheng Jing, Zhi Yong Cheng, Ze Long Zhou, Bing Jie Zhu

Keywords:

MEMS, Silicon-Beam, SiO₂ Layer, Undercut, Wet Etching

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