Simulation Research on Optical Performance of Multicrystalline Silicon Texture Structure

Abstract:

The finite element model of double etching pits was established, optical performance of multicrystalline silicon wafer before and after etching was simulated by RF MODULE of COMSOL Multiphysics version 3.5a. Optical characteristic of unetching wafer and acidic textured were compared. It is indicates that acidic textured (double etching pits) has low reflectivity, high power flow Y component , the better light trapping. When the wavelength is 600nm, the maximum and minimum value of surface electric field Z component of acidic textured are 1.9 times and 1.4 times respectively than that of unetching wafer, and two extremum value of surface magnetic field Z component are 2.1 times and 1.9 times respectively than that of unetching wafer. Numerical simulation results of Multi hole model are closely with experimental values, which can guide the practical production.

• Periodical: Applied Mechanics and Materials (Volumes 599-601)
• Pages: 99-102
• DOI: https://doi.org/10.4028/www.scientific.net/AMM.599-601.99
• Online since: August 2014
• Authors: Fa Yun Zhang*
• Keywords: Double Etching Pits, Multicrystalline Silicon, Numerical Simulation, Reflectivity, Texturing

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