Applied-Information Technology in Concentration Depth Profile of Multi-Charged Mo Ion Implantation

Abstract:

Monte Carlo computer simulations based on the binary collision approximation, TRIDYN program, have been applied to calculate the concentration depth profiles of implanted multi-charged molybdenum ions in H13 steel. The sputtering effect of a high dose ion implantation and influence of multi-charged ions on the concentration depth profile of implanted molybdenum ions can both be considered in the TRIDYN simulation. For the Monte Carlo computer simulation, the chosen pseudo-projectiles are 500000. The chosen extraction voltages are 48kV and 25kV, respectively, and an implantation doses of 5×10¹⁷cm^-2 to compare the results which have been published related to molybdenum ion implantation. TRIDYN program is better than SRIM program in the calculation of the concentration depth profiles of implanted multi-charged ions. And the calculation result of the TRIDYN program is different from the experiment result. The other factors of affecting the concentration depth profile have also been discussed finally.

• Periodical: Applied Mechanics and Materials (Volume 662)
• Pages: 115-118
• DOI: https://doi.org/10.4028/www.scientific.net/AMM.662.115
• Online since: October 2014
• Authors: Jian Hua Yang*, Xing Jian Ma
• Keywords: Ion Implantation, Multi-Charged Ion, Pseudo-Projectile, Sputtering Effect

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