Construction of a Digital Microlithography System Based on Violet Semiconductor Laser

Hao Wei Li; Yong Qing Gong; Wei Wei Zhang; Ming Jiu Xiahou

doi:10.4028/www.scientific.net/AMM.696.76

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HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vol. 696Construction of a Digital Microlithography System...

Construction of a Digital Microlithography System Based on Violet Semiconductor Laser

Abstract:

A digital mask microlithography system is designed and constructed, which employs a 405nm semiconductor laser diode as light source, and uses a DMD (Digital Micro-mirror Device) as high-precision digital mask. The microstructure array with logo and optical grating has been obtained successfully on this system. Lithography results have been evaluated carefully with the aid of microscope and white light scanning profiler. The feasibility of the microlithography system has been further proved.

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Periodical:

Applied Mechanics and Materials (Volume 696)

Pages:

76-82

DOI:

https://doi.org/10.4028/www.scientific.net/AMM.696.76

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Online since:

November 2014

Authors:

Hao Wei Li*, Yong Qing Gong, Wei Wei Zhang, Ming Jiu Xiahou

Keywords:

Microlithography System, Microstructure Array, Violet Semiconductor Laser

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* - Corresponding Author

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