Research and Development of Nanoimprint Lithography Technology

Jian Gang Chen; Li Jun Liu; Zhi Xin Zhao; Ju Rong Liu

doi:10.4028/www.scientific.net/AMM.757.99

Paper Titles

The Generalized Dynamic Factor of Hydraulic Excavator Working Device
p.75

The Statics Characteristic Analysis of Fixed Beam Gantry Machine Tool Crossbeam Based on ANSYS
p.81

Dynamic Unstructured Grids Method with Applications to Unsteady Flows Involving Moving Boundaries
p.87

Mesh Dynamics Analysis of Gear Shaving Cutter Research Based on ADAMS Software
p.93

Research and Development of Nanoimprint Lithography Technology
p.99

The Topological Optimization of the Fixing Plank for the Hydraulic Motor
p.105

Rigid and Flexible Dynamics Simulation of 2-PRR Parallel Mechanism
p.109

Theoretical Research and Improvement of Cutter Head for Earth Pressure Balance Shield Pipe-Jacking Machine
p.115

A Numerical Solution for Vibration Analysis of the Stiffened Variable-Thickness Conical Shells
p.121

HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vol. 757Research and Development of Nanoimprint...

Research and Development of Nanoimprint Lithography Technology

Abstract:

This paper introduces research situation and prospect of nanoimprint lithography technology. The process of three common lithography (Such as hot press printing, UV curing stamping and Micro Contact stamping) is discussed. For getting better quality, the method and main factors of nanoimprint lithography pattern are analyzed. Furthermore, some key problems of the nanoimprint lithography process are solved for the purpose of the further understands for this process. A new way of thinking is provided for development new nanoimprint lithography technology in the paper.

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Periodical:

Applied Mechanics and Materials (Volume 757)

Pages:

99-103

DOI:

https://doi.org/10.4028/www.scientific.net/AMM.757.99

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Online since:

April 2015

Authors:

Jian Gang Chen*, Li Jun Liu, Zhi Xin Zhao, Ju Rong Liu

Keywords:

Graphics Quality, Nanoimprint Lithography, Process, Scientific Basis

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* - Corresponding Author

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