Uniform Deposition of Titanium Dioxide Films by Chemical Vapor Deposition (CVD)

M.S. Rahim; Mohd Zainizan Sahdan; Jais Lias

doi:10.4028/www.scientific.net/AMM.773-774.744

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HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vols. 773-774Uniform Deposition of Titanium Dioxide Films by...

Uniform Deposition of Titanium Dioxide Films by Chemical Vapor Deposition (CVD)

Abstract:

Titanium is a lightweight metal with an outstanding combination of properties which make it the material of choice for many different applications. This paper investigates the structure, surface characteristics and electrical properties of the Titanium Dioxide (TiO₂) thin ﬁlm, deposited by chemical vapor deposition (CVD). The deposition temperature was 1000°C with 3 different positions of the glass substrates. The surface morphologies were examined using a field emission scanning electron microscope (FESEM) and an atomic force microscopy (AFM). In order to investigate the structural properties, the TiO₂ thickness was measured using a surface profiler. The optical properties of TiO₂ were measured using an ultraviolet visible spectroscopy (UV-Vis). The surface morphology was found to be sensitive to the deposition parameters and the growth TiO₂ is more uniform when the position of substrate is closed to the starting material.

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Periodical:

Applied Mechanics and Materials (Volumes 773-774)

Pages:

744-748

DOI:

https://doi.org/10.4028/www.scientific.net/AMM.773-774.744

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Online since:

July 2015

Authors:

M.S. Rahim, Mohd Zainizan Sahdan*, Jais Lias

Keywords:

CVD, Structural Properties, TiO2, UV-VIS

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Creative Commons CC BY 4.0

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* - Corresponding Author

References

[1] Rousseau et al. Multi-donor molecular bulk heterojunction solar cells: improving conversion efficiency by synergistic dye combinations. Journal of Materials Chemistry, 2009; 19 (16): 2298 DOI: 10. 1039/b903189h.

DOI: 10.1039/b903189h

Google Scholar

[2] Cheuk Wing Lee, Jin Zhong, Top down strategy for renewable energy investment: conceptual framework and implementation, Renewable Energy 68 (2014) 761-773.

DOI: 10.1016/j.renene.2014.03.015

Google Scholar

[3] M.A. green, Energy policy 28 (2000) 989.

Google Scholar

[4] Xiaoli Lui and Zhiyu Jiang, cylic voltammetric and AC Impedance Behaviour at TiO2 Electrodes under UV Illumination, journal of the chemical society, 2003, 50, 1003-1008.

DOI: 10.1002/jccs.200300141

Google Scholar

[5] H. Kashani*, M. Heydarzadeh Sohi, H. Kaypour, Microstructural and physical properties of titanium nitride coating produced by CVD process, Materials Science and Engineering A286 (2000) 324-330.

DOI: 10.1016/s0921-5093(00)00744-9

Google Scholar

[6] P.S. Shinde, C.H. Bhosale, Properties of chemical vapour deposited nanocrystalline TiO2 thin film and their use in dye-sensitized solar cells, J. Anal. Appl. Pyrolysis 82 (2008) 83-88.

DOI: 10.1016/j.jaap.2008.01.004

Google Scholar

[7] H. Natsuhara, T. Tatsuyama, M. Ushiro, M. Furuhashi, T. Fujii, F. Ohashi, N. Yoshida, S. Nonomura, Preparation of SnO2 thin ﬁlms at low temperatures with H2 gas by the hot-wire CVD method, Thin Solid Film 519 (2011) 4538-4541.

DOI: 10.1016/j.tsf.2011.01.309

Google Scholar