Design of Applied Diffusion Pump System for Electron Beam Process

Abstract:

Article Preview

Efficiency of vacuumizing is vital to process time with electron beam. The system principle of vacuum system was designed based on the analysis of system request. The workflow of vacuum system was established and its characteristic was introduced. The controlling theory and circuit of vacuum system was designed while vacuum device was made and its performance was tested. The vacuum system was acquired which was suitable to electronic beam.

Info:

Periodical:

Edited by:

Linli Xu, Wenya Tian and Elwin Mao

Pages:

1295-1299

DOI:

10.4028/www.scientific.net/AMM.80-81.1295

Citation:

Y. Jin et al., "Design of Applied Diffusion Pump System for Electron Beam Process", Applied Mechanics and Materials, Vols. 80-81, pp. 1295-1299, 2011

Online since:

July 2011

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Price:

$35.00

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