p.1273
p.1278
p.1284
p.1289
p.1295
p.1300
p.1305
p.1310
p.1315
Design of Applied Diffusion Pump System for Electron Beam Process
Abstract:
Efficiency of vacuumizing is vital to process time with electron beam. The system principle of vacuum system was designed based on the analysis of system request. The workflow of vacuum system was established and its characteristic was introduced. The controlling theory and circuit of vacuum system was designed while vacuum device was made and its performance was tested. The vacuum system was acquired which was suitable to electronic beam.
Info:
Periodical:
Pages:
1295-1299
Citation:
Online since:
July 2011
Authors:
Keywords:
Price:
Сopyright:
© 2011 Trans Tech Publications Ltd. All Rights Reserved
Share:
Citation: