[1]
M.A. Lieberman and A.J. Lichtenberg: Principles of Plasma Discharges and Materials Processing (Second Edition, John Wiley & Sons, Inc Publication, USA 2005).
Google Scholar
[2]
O.A. Popov: J. Vac. Sci. Technol. A, Vol. 7 (1989), p.894.
Google Scholar
[3]
S. Shapoval, V. Borodin, V. Gorbunov and A. Veretennikov: ECR-plasma equipment application for nanotechnology. 2004 7th Int. Conf. on Solid-State and Integrated Circuits Technology Proceedings, Beijing, China, 18-21 Oct. (2004).
DOI: 10.1109/icsict.2004.1435071
Google Scholar
[4]
S.M. Gorbatkin, L.A. Berry and J.B. Roberto: J. Vac. Sci. Technol. A, Vol. 8 (1990), p.2893.
Google Scholar
[5]
R. Anton, Th. Wiegner, W. Naumann, M. Liebmann, Chr. Klein and Chr. Bradley: Rev. Sci. Instrum., Vol. 71 (2000), p.1177.
Google Scholar
[6]
D. Kimura, Y. Kurisu, D. Nozaki, K. Yano, Y. Imai, S. Kumakura, F. Sato, Y. Kato and T. Iida: Rev. Sci. Instrum., Vol. 85 (2014), p. A2938.
Google Scholar
[7]
F.C. Sze and J. Asmussen: J. Vac. Sci. Technol. A, Vol. 11 (1993), p.1289.
Google Scholar
[8]
E. Camps, O. Olea, C. GutiérrezTapia, and M. Villagrán: Rev. Sci. Instrum., Vol. 66 (1995), p.3219.
Google Scholar
[9]
S.M. Hwang, J.G. Yang, N.S. Yoon, J. Hong, B.C. Kim, K. -I. You and Hanbit Project Team: Rev. Sci. Instrum., Vol. 69 (1998), p.846.
Google Scholar
[10]
C. Perret, A. Girard, H. Khodja and G. Melin: Phys. Plasmas, Vol. 6 (1999), p.3408.
Google Scholar
[11]
G. Shirkov: Rev. Sci. Instrum., Vol. 71 (2000), p.850.
Google Scholar
[12]
A. Heinen, M. Rüther, J. Ducrée, J. Leuker, J. Mrogenda, H. W. Ortjohann, E. Reckels, Ch. Vitt and H. J. Andrä: Rev. Sci. Instrum., Vol. 69 (1998), p.729.
DOI: 10.1063/1.1148667
Google Scholar
[13]
A. Megía-Macías, O. D. Cortázar and A. Vizcaíno-de-Julián: Rev. Sci. Instrum., Vol. 85 (2014), p.033310.
Google Scholar
[14]
C. Gaudin, L. Hay, J. M. Buzzi, M. Bacal and M. Lamoureux: Rev. Sci. Instrum., Vol. 69 (1998), p.890.
Google Scholar
[15]
R.D. Tarey, N. Arora, A. Ganguli and R. Narayanan: Plasma production in large volume plasma system by compact electron cyclotron resonance sources. 2013 IEEE 40th Int. Conf. on Plasma Sciences, San Francisco, CA, USA, 16-21 Jun. (2013).
DOI: 10.1109/plasma.2013.6633474
Google Scholar
[16]
A. Ganguli, R.D. Tarey, N. Arora, R. Narayanan and K. Akhtar: Development of compact electron cyclotron resonance plasma source. 2013 IEEE 40th Int. Conf. on Plasma Sciences, San Francisco, CA, USA, 16-21 Jun. (2013).
DOI: 10.1109/plasma.2013.6633473
Google Scholar
[17]
S.J. Pearton, C.R. Abernathy and F. Ren: Appl. Phys. Lett., Vol. 64 (1994), p.2294.
Google Scholar
[18]
N. Fujiwara, T. Maruyama and M. Yoneda: Profile Control of Poly-Si Etching in Electron-Cyclotron-Resonance Plasma. 16th Dry Process Symposium, Tokyo, Japan, 10-11 Nov. (1994).
Google Scholar
[19]
F.J. Gómez, P. Prieto, E. Elizalde and J. Piqueras: Appl. Phys. Lett., Vol. 69 (1996), p.773.
Google Scholar
[20]
W.M. Holber, J.S. Logan, H.J. Grabarz, J.T.C. Yeh, J.B.O. Caughman, A. Sugerman and F.E. Turene: J. Vac. Sci. Technol. A, Vol. 11 (1993), p.2903.
Google Scholar
[21]
K.D. Vargheese and G.M. Rao: Rev. Sci. Instrum., Vol. 71 (2000), p.467.
Google Scholar
[22]
S. Shinohara, T. Hada, T. Motomura, K. Tanaka, T. Tanikawa, K. Toki, Y. Tanaka and K.P. Shamrai: Phys. Plasmas, Vol. 16 (2009), p.057104.
DOI: 10.1063/1.3096787
Google Scholar
[23]
M.U. Siddiqui and N. Hershkowitz: Phys. Plasmas, Vol. 21 (2014), p.020707.
Google Scholar
[24]
T. Miao, H. Zhao, Z. Liu, Y. Shang, L. Sun, X. Zhang and H. Zhao: Rev. Sci. Instrum., Vol. 81 (2010), p. 02B105.
Google Scholar
[25]
Yu.M. Aliev and M. Krämer: Phys. Plasmas, Vol. 21 (2014), p.013508.
Google Scholar
[26]
K.K. Barada, P.K. Chattopadhyay, J. Ghosh, S. Kumar and Y.C. Saxena: Phys. Plasmas, Vol. 20 (2013), p.042119.
Google Scholar
[27]
P.K. Chattopadhyay, K.K. Barada, J. Ghosh, D. Sharma and Y.C. Saxena: Study of density peaking in a diverging magnetic field helicon experiment. Int. Conf. on Complex Processes in Plasmas and Nonlinear Dynamical Systems, Gandhinagar, India, 6-9 Nov. (2012).
DOI: 10.1063/1.4865362
Google Scholar
[28]
S. Shinohara, H. Nishida, T. Tanikawa, T. Hada, I. Funaki and K.P. Shamrai: IEEE Transactions on Plasma Science, Vol. 42 (2014), p.1245.
DOI: 10.1109/tps.2014.2313633
Google Scholar
[29]
T. Ziemba, P. Euripides, J. Slough, R. Winglee, L. Giersch, J. Carscadden, T. Schnackenberg and S. Isley: Plasma Sources Sci. Technol., Vol. 15 (2006), p.517.
DOI: 10.1088/0963-0252/15/3/030
Google Scholar
[30]
T. Lafleur: Phys. Plasmas, Vol. 21 (2014), p.043507.
Google Scholar
[31]
O. Batishchev and K. Molvig: Modeling of a helicon plasma source. 28th IEEE Int. Conf. on Plasma Science and 13th IEEE Int. Pulsed Power Conf., Las Vegas, NV, USA, 17-22 Jun. (2001).
DOI: 10.1109/ppps.2001.1002007
Google Scholar
[32]
C. Charles: J. Phys. D: Appl. Phys., Vol. 42 (2009), p.163001.
Google Scholar
[33]
K. Takahashi, C. Charles, R. Boswell, W. Cox and R. Hatakeyama: Appl. Phys. Lett., Vol. 94 (2009), p.191503.
Google Scholar
[34]
K. Takahashi, C. Charles, R. Boswell and A. Ando: J. Phys. D: Appl. Phys., Vol. 46 (2013), p.352001.
Google Scholar
[35]
E. Ahedo and J. Navarro-Cavallé: Phys. Plasmas, Vol. 20 (2013), p.043512.
Google Scholar
[36]
O.V. Batishchev: IEEE Transactions on Plasma Science, Vol. 37 (2009), p.1563.
Google Scholar
[37]
N. Takahashi, H. Murata, H. Mitsubori, J. Sakuraba, T. Soga, Y. Aoki, T. Katoh, Y. Saitoh, K. Yamada, N. Ikenaga and N. Sakudo: Rev. Sci. Instrum., Vol. 85 (2014), p. 02C306.
DOI: 10.1063/1.4826675
Google Scholar
[38]
L. Chen and Q. Yang: Proc. of SPIE, Vol. 8685 (2013), p. 86850H.
Google Scholar
[39]
L. Chen, J. Zhao, R.V. Bravenec and M. Funk, U.S. Patent 8, 415, 884 B2 (2013).
Google Scholar
[40]
Z. Chen, M. Liu, C. Lan, W. Chen, L. Tang, Z. Luo, B. Yan, J. Lu and X. Hu: Chin. Phys. B, Vol. 18 (2009), p.3484.
Google Scholar
[41]
T. Yamauchi, E. Abdel-Fattah and H. Sugai: Japanese Journal of Applied Physics, Vol. 40 (2001), p. L1176.
Google Scholar
[42]
J. Henriques, E. Tatarova, F. M. Dias and C. M. Ferreira: J. Appl. Phys., Vol. 103 (2008), p.103304.
Google Scholar
[43]
C. Lan, X. Hu, W. Wang and M. Liu: Plasma Science and Technology, Vol. 12 (2010), p.129.
Google Scholar
[44]
L. Xu, F. Terashita, H. Nonaka, A. Ogino, T. Nagata, Y. Koide, S. Nanko, I. Kurawaki and M. Nagatsu: J. Phys. D: Appl. Phys., Vol. 39 (2006), p.148.
DOI: 10.1088/0022-3727/39/1/022
Google Scholar
[45]
M. Nagatsu, F. Terashita, H. Nonaka, L. Xu, T. Nagata and Y. Koide: Appl. Phys. Lett., Vol. 86 (2005), p.211502.
DOI: 10.1063/1.1931050
Google Scholar
[46]
M. Goto, K. Azuma, T. Okamoto and Y. Nakata: Japanese Journal of Applied Physics, Vol. 42 (2003), p.7033.
Google Scholar