Research on Material Thickness and Material Properties with Application of Sensors

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With the wide application of thin film technology and optoelectronic devices, optical films have been widely used in the development and production of weapons and special devices for basic research. Faced with constantly updated status quo and development of optical thin film precision measurement of various parameters on a higher requirements, the film thickness is one of the key parameters in film design and manufacturing process. Particularly with the rapid development of nanoscale thin-film technology, the film thickness becomes a hot issue in the research field. For solid film thickness, the main measuring means are screw micrometer, microscopy, interferometry and polarization. Conventional Michelson interferometer can measure thin film thickness which is transparent and known, and the devices with sensors performance better.

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33-36

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August 2014

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© 2014 Trans Tech Publications Ltd. All Rights Reserved

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[1] Shen Weidong, Liu Xu, Zhu Yong, Transmittance Test Curve to Determine the Optical Constants of the Semiconductor Thin Film Thickness [J]. Journal of Semiconductors, 2005, 26 (2): 335-340.

Google Scholar

[2] Tang Jin, Peifu gu. Thin Film Optical Technology [M]. Beijing: China Machine Press, (1989).

Google Scholar

[3] Zhang Yinhua, Huang Wei . Several Infrared Optical Characteristics of Thin Film Materials [J]. Optical Instruments, 2006, 28 (4): 104-108.

Google Scholar

[4] Fang Rongchuan. Solid Spectroscopy [M]. Hefei: China University of Science and Technology Press (2001).

Google Scholar

[5] THIELSCH R. Optical Coatings for the DUV/VUV in Optical Interference Coatings[M]. Springer Series in OpticalSciences, 2003, 88: 257-279.

DOI: 10.1007/978-3-540-36386-6_11

Google Scholar

[6] BAKSHI V. EUV Lithography[M]. Bellingham, Washington, SPIE Optical Engineering Press, (2006).

Google Scholar

[7] Mai Zhenhong. X-ray Film Structure Characterization [M]. Beijing: Science Press, (2007).

Google Scholar

[8] Zhu Hongli. Jin Chunshui, Zhang Lichao. X-ray Diffraction Assembling Error Analysis [J]. Analytical Instruments, 2008 (1): 14-18.

Google Scholar

[9] Song Min, Li Boxin, Zheng Yaru. Study of Using Optical Methods for Measuring Film Thickness [j]. Optical Technology, 2004, 30 (1): 103-106.

Google Scholar

[10] Fan Xizhi, Li Gang, Zhu Jun. Interference with Extreme Method of Monitoring Organic Electroluminescent Thin Film Thickness [J]. Optical Instruments, 1999, 21 (3): 45-58.

Google Scholar

[11] Cheng Hongliang, Wang Zhong, Wu Shaolin. Double Spiral Micrometer Screw Error Compensation and Comprehensive Indication Error [J]. Optical Technology, 1992, 11 (5): 39-43. Design.

Google Scholar

[12] ZHU R i-hong, CHEN L ei, WAN G Q ing, et al. Phase-shift interferomet ry and its app licat ion [ J ]. Journal of App lied Op t ics, 2006, 27 ( 2) : 85-88. ( in Chinese).

Google Scholar

[13] GU Yuan, FU Sizu, HUANG Xiuguang, et al. Equations of state under extremely high pressure obtained by high power laser experiments[J]. Physics, 2007, 36(6): 465-471(in Chinese).

Google Scholar

[14] YE Junjian, ZHOU Bin, HE Juhua, et al. Fabrication and measurement of impedance match target[J]. At Energy Sci Technol, 2008, 42(9): 825-828(in Chinese).

Google Scholar

[15] WANG X K, WANG L H , ZH ANG X J. Testing of w eak asphere sur face by real􀀁t ime inter ferometer[ J] . Opt. P r ecision Eng . , 2008, 16( 2) : 184-189. ( in Chinese).

Google Scholar

[16] ZHU Ri-hong, CHEN Jin-bang, WAN G Qing, et al. A new algo rithm on phase shifting interferomet ry: the overlapp -ing averaging 4-F rame algo rithm [J]. A cta Op t ica Sinica, 1994, 14 ( 12 ) : 1288-1293. ( in Chinese).

Google Scholar

[17] HE Yong, ZHU R i-hong, CHEN L ei. Research of w ave unw rapp ing algo rithm based on the region growing theory [J]. Op t ical Technique, 2006, 32 (4) : 594-597. (in Chinese).

Google Scholar