[1]
Shen Weidong, Liu Xu, Zhu Yong, Transmittance Test Curve to Determine the Optical Constants of the Semiconductor Thin Film Thickness [J]. Journal of Semiconductors, 2005, 26 (2): 335-340.
Google Scholar
[2]
Tang Jin, Peifu gu. Thin Film Optical Technology [M]. Beijing: China Machine Press, (1989).
Google Scholar
[3]
Zhang Yinhua, Huang Wei . Several Infrared Optical Characteristics of Thin Film Materials [J]. Optical Instruments, 2006, 28 (4): 104-108.
Google Scholar
[4]
Fang Rongchuan. Solid Spectroscopy [M]. Hefei: China University of Science and Technology Press (2001).
Google Scholar
[5]
THIELSCH R. Optical Coatings for the DUV/VUV in Optical Interference Coatings[M]. Springer Series in OpticalSciences, 2003, 88: 257-279.
DOI: 10.1007/978-3-540-36386-6_11
Google Scholar
[6]
BAKSHI V. EUV Lithography[M]. Bellingham, Washington, SPIE Optical Engineering Press, (2006).
Google Scholar
[7]
Mai Zhenhong. X-ray Film Structure Characterization [M]. Beijing: Science Press, (2007).
Google Scholar
[8]
Zhu Hongli. Jin Chunshui, Zhang Lichao. X-ray Diffraction Assembling Error Analysis [J]. Analytical Instruments, 2008 (1): 14-18.
Google Scholar
[9]
Song Min, Li Boxin, Zheng Yaru. Study of Using Optical Methods for Measuring Film Thickness [j]. Optical Technology, 2004, 30 (1): 103-106.
Google Scholar
[10]
Fan Xizhi, Li Gang, Zhu Jun. Interference with Extreme Method of Monitoring Organic Electroluminescent Thin Film Thickness [J]. Optical Instruments, 1999, 21 (3): 45-58.
Google Scholar
[11]
Cheng Hongliang, Wang Zhong, Wu Shaolin. Double Spiral Micrometer Screw Error Compensation and Comprehensive Indication Error [J]. Optical Technology, 1992, 11 (5): 39-43. Design.
Google Scholar
[12]
ZHU R i-hong, CHEN L ei, WAN G Q ing, et al. Phase-shift interferomet ry and its app licat ion [ J ]. Journal of App lied Op t ics, 2006, 27 ( 2) : 85-88. ( in Chinese).
Google Scholar
[13]
GU Yuan, FU Sizu, HUANG Xiuguang, et al. Equations of state under extremely high pressure obtained by high power laser experiments[J]. Physics, 2007, 36(6): 465-471(in Chinese).
Google Scholar
[14]
YE Junjian, ZHOU Bin, HE Juhua, et al. Fabrication and measurement of impedance match target[J]. At Energy Sci Technol, 2008, 42(9): 825-828(in Chinese).
Google Scholar
[15]
WANG X K, WANG L H , ZH ANG X J. Testing of w eak asphere sur face by realt ime inter ferometer[ J] . Opt. P r ecision Eng . , 2008, 16( 2) : 184-189. ( in Chinese).
Google Scholar
[16]
ZHU Ri-hong, CHEN Jin-bang, WAN G Qing, et al. A new algo rithm on phase shifting interferomet ry: the overlapp -ing averaging 4-F rame algo rithm [J]. A cta Op t ica Sinica, 1994, 14 ( 12 ) : 1288-1293. ( in Chinese).
Google Scholar
[17]
HE Yong, ZHU R i-hong, CHEN L ei. Research of w ave unw rapp ing algo rithm based on the region growing theory [J]. Op t ical Technique, 2006, 32 (4) : 594-597. (in Chinese).
Google Scholar