Behavior of Oxidizing Substances on NO Gas Oxidation in Fenton System

Abstract:

There are variety of active substances in Fenton system, such as H₂O₂, HO₂^-, O₂^-·, ·OH and HO₂·. In this paper, the oxidation of H₂O₂, HO₂^-, O₂^-·, ·OH and HO₂· on NO gas was determined respectively with experimental methods. The results showed that direct oxidation of gaseous NO by H₂O₂, HO₂^- and O₂^-·was weak. ·OH and HO₂· had strong oxidizing capacity on gaseous NO, especially ·OH. With the acceleration of ·OH and HO₂· generation rate, the oxidizability of Fenton system on NO gas was stronger, but O₂ generation rate also accelerated. Rapid decomposition of H₂O₂ is the premise to realize high NO oxidation efficiency using H₂O₂, but how to avoid the invalid decomposition of H₂O₂ is the key to increase use ratio of H₂O₂.

• Periodical: Advanced Materials Research (Volumes 1073-1076)
• Pages: 764-769
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.1073-1076.764
• Online since: December 2014
• Authors: Hai Qian Zhao, Ji Hui Gao*, Zhong Hua Wang, Shao Hua Wu
• Keywords: Decomposition, Fenton System, NO, Oxidizing Substances

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