[1]
P.J. Cumpson, Angle-resolved XPS and AES: Depth-resolution limits and a general comparison of properties of depth-profile reconstruction methods, J. Electron Spectrosc. Relat. Phenom. 73 (1995) 25-52.
DOI: 10.1016/0368-2048(94)02270-4
Google Scholar
[2]
A. Herrera-Gomez, J.T. Grant, P.J. Cumpson, M. Jenko, F.S. Aguirre-Tostado, C.R. Brundle, T. Conard, G. Conti, C.S. Fadley, J. Fulghum, K. Kobayashi, L. Kövér, H. Nohira, R.L. Opila1, S. Oswald, R.W. Paynter, R.M. Wallace, W.S.M. Werner, J. Wolstenholme, Report on the 47th IUVSTA Workshop Angle-Resolved XPS: the current status and future prospects for angle-resolved XPS of nano and subnano films, Surf. Interface Anal. 41 (2009).
DOI: 10.1002/sia.3105
Google Scholar
[3]
J. Diao, D.W. Hess, Use of angle-resolved XPS to determine depth profiles based on Fick's second law of diffusion: description of method and simulation study, J. Electron Spectrosc. Relat. Phenom. 135 (2004) 87-104.
DOI: 10.1016/j.elspec.2003.12.008
Google Scholar
[4]
C.R. Brundle, G. Conti, P. Mack, XPS and angle resolved XPS, in the semiconductor industry: Characterization and metrology control of ultra-thin films, J. Electron Spectrosc. Relat. Phenom. 178-179 (2010) 433-448.
DOI: 10.1016/j.elspec.2010.03.008
Google Scholar
[5]
H. Yoshikawa, H. Tanaka, M. Kimura, T. Ogiwara, T. Kimura, S. Fukushima, K. Kumagai, S. Tanuma, M. Suzuki, K. Kobayashi, Evaluation of Depth Distribution Function for AR-XPS using Synchrotron Radiation Hard X-ray, J. of Surf. Anal. 15 (2009).
DOI: 10.1384/jsa.15.254
Google Scholar
[6]
M.S. Vinodh and L.P.H. Jeurgens, Quantitative analysis of angle-resolved XPS spectra recorded in parallel data acquisition mode, Surf. Interface Anal. 36 (2004) 1629-1636.
DOI: 10.1002/sia.2000
Google Scholar
[7]
C.J. Powell, A. Jablonski, Progress in quantitative surface analysis by X-ray photoelectron spectroscopy: Current status and perspectives, J. Electron Spectrosc. Relat. Phenom. 178-179 (2010) 331-346.
DOI: 10.1016/j.elspec.2009.05.004
Google Scholar
[8]
M. Vicanek, Electron transport processes in reflection electron energy loss spectroscopy (REELS) and X-ray photoelectron spectroscopy (XPS), Surf. Sci. 440 (1999) 1-40.
DOI: 10.1016/s0039-6028(99)00784-0
Google Scholar
[9]
V.P. Afanas'ev, D.S. Efremenko, D.A. Ivanov, P.S. Kaplya, A.V. Lubenchenko, Photoelectron Emission for Layers of Finite Thickness, J. Surf. Invest.: X-Ray, Synchrotron Neutron Tech. 7, No. 2 (2013) 382-387.
DOI: 10.1134/s1027451013020274
Google Scholar
[10]
Information on http: / www. nist. gov/srd/nist64. cfm.
Google Scholar
[11]
S. Tanuma, C.J. Powell, D.R. Penn, Calculations of electron inelastic mean free paths for 31 materials, Surf. Interf. Anal. 11 (1988) 577.
DOI: 10.1002/sia.740111107
Google Scholar
[12]
A.A. Batrakov, A.V. Lubenchenko, Monte-Carlo Simulations of Spectra for Elastic Pick Electron Spectroscopy, Matematicheskoe Modelirovanie. 23, 3 (2011) 22-26. /in Russian.
Google Scholar