An In-House Approach for Fabrication of Poly-Silicon Nanobiosensor Using Conventional Photolithography and Etching Method

Abstract:

In this work, we demonstrated a method to fabricate and characterize poly-silicon nanowires for biosensing application using conventional photolithography and etching process. Nanowires Mask must be first designed using AutoCAD, before patterning onto chrome mask. Chrome mask was used for better photo masking and to transfer structure onto poly-silicon layer. The poly-silicon nanowires process flow were developed which includes all the fabrication process such as growth, deposition, lithography and etching process. In order to prove the effectiveness of the fabricated devices as a biologically sensor (Biosensor), the poly-silicon nanowires is modified chemically to allow the integration with biological element. The drain (I_d) was found to increase after the DNA immobilization and hybridization. These results demonstrate that the in-house fabricated poly-silison nanobiosensor is capable as a platform for label-free biosensing. The morphological characterizations were carried out using a Scanning Electron Microscope (SEM) and Atomic Force Microscope (AFM). Besides that, the electrical measurement of the poly-silicon biosensor were carried out using a KEITHLEY 6487 picoampmeter/voltage source.

• Periodical: Advanced Materials Research (Volume 1109)
• Pages: 210-213
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.1109.210
• Online since: June 2015
• Authors: M.N. Md Nuzaihan*, U. Hashim, Chun Hong Voon, A. Rahim Ruslinda
• Keywords: Conventional Photolithography, Etch/Trimming Process, Nanowires, Poly-Silicon

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