Structural and Mechanical Properties of Ti-W-N Thin Films by Dual Unbalanced Magnetron Sputtering

Abstract:

Ti-W-N thin films grown on Si (100) and AISI D2 steel substrates had been deposited by a d.c. magnetron sputtering with pure Ti and W targets in a mixture of Ar and N₂ plasma. The nitrogen partial pressure was varied from 0% to 9% of total gas. All Ti-W-N films were formed in solid solution with determination by x-ray diffractrogram analysis. A strong preferred orientation TiN(111) was detected. Their mechanical properties were studied using nanoindentation with Berkovich tip. An increase in hardness was observed with increasing nitrogen partial pressure. The optimum protective coating for plastic deformation was Ti-W-N film grown at 9% nitrogen partial pressure. Chemical bonding of Ti-W-N films was investigated by x-ray photoelectron spectroscopy. Binding energy analysis showed that N was mainly in TiN and W₂N. The corrosion behavior was studied in variation of nitrogen partial pressure. Ti-W-N films deposited on steel at low nitrogen partial pressure showed excellent corrosion resistance in NaCl solution.

• Periodical: Advanced Materials Research (Volume 1131)
• Pages: 246-250
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.1131.246
• Online since: December 2015
• Authors: Pattira Homhuan*, Jiraporn Pongsopa, Kanchaya Honglertkongsakul
• Keywords: Magnetron Sputtering, Thin Film, Ti-W-N

References

[1] E.C. Samano, A. Clemente, J.A. Diaz, G. Sota, Mechanical properties optimization of tungsten nitride thin films grown by reactive sputtering and laser ablation, Vacuum 85 (2010) 69-77.

DOI: 10.1016/j.vacuum.2010.04.004

[2] P.N. Silva, J.P. Dias, A. Cavaleiro, Performance of W-Ti-N coated pins lubricated pin-on-disk tests, Surf. Coat. Technol. 202 (2008) 2338-2343.

DOI: 10.1016/j.surfcoat.2007.09.039

[3] T. Polcar, A. Cavaleiro, Structure, mechanical properties and tribology of W-N and W-O coatings, Int. J. Refract. Met. H. 28 (2010) 15-22.

[4] G. Abadias, S. Dub, R. Shmegera, Nanoindentation hardness and structure of ion beam sputtered TiN, W and TiN/W multilayer hard coatings, Surf. Coat. Technol. 200 (2006) 6538-6543.

DOI: 10.1016/j.surfcoat.2005.11.053

[5] J.C. Caicedo, L. Yate, J. Montes, Improving the physicochemical surface properties on AISI D3 steel coated with Ti-W-N. Surf. Coat. Technol. 205 (2011) 2947-2953.

DOI: 10.1016/j.surfcoat.2010.11.005

[6] Q. Luo, S. Yang, K.E. Cooke, Hybrid HIPIMS and DC magnetron sputtering deposition of TiN coatings deposition rate, structure and tribological properties, Surf. Coat. Technol. 236 (2013) 13-21.

DOI: 10.1016/j.surfcoat.2013.07.003

[7] G.A. Zhang, P.X. Yan, P. Wang, Y.M. Chen, J.Y. Zhang, The structure and tribological behaviors of CrN and Cr-Ti-N coating, Appl. Surf. Sci. 253 (2007) 7353.

DOI: 10.1016/j.apsusc.2007.02.061

[8] L.R. Shaginyan, M. Misina, J. Zemek, J. Musil, F. Regent, V.F. Britun, Thin solid films 408 (2002) 136-147.

DOI: 10.1016/s0040-6090(02)00091-3

[9] S. Zhou, W. Liu, H. Liu, C. Cai, Structural and electrical properties of Ti-W-N thin films deposited by reactive RF sputtering, Physics Procedia 18 (2011) 66-72.

DOI: 10.1016/j.phpro.2011.06.059

[10] P. Homhuan, J. Pongsopa, K. Honglertkongsakul, Effect of nitrogen on the structural and electrical properties of Ti-W-N thin films, Burapa Science Journal Special volume (2014) 318-327.

[11] E.C. Samano, A. Clemente, J.A. Diaz, G. Sato. Mechanical properties optimization of tungsten nitride thin films grown by reactive sputtering and laser ablation, Vacuum 85 (2010) 69-77.

DOI: 10.1016/j.vacuum.2010.04.004

[12] J.C. Caicedo, L. Yate, J. Montes, Inproving the physicochemical surface properties on AISI D3 steel coated with Ti-W-N, Surf. Coat. Technol. 205 (2011) 2947-2953.

DOI: 10.1016/j.surfcoat.2010.11.005

[13] X. Liu, F. Yuan, Y. Wei, Grain size effect on the hardness of nanocrystal measured by the nanosize indenter, Appl. Surf. Sci 279 (2013) 159-166.

DOI: 10.1016/j.apsusc.2013.04.062

[14] M. Wen, Q.N. Meng, W.X. Yu, W.T. Zheng, S.X. Mao, M.J. Hua, Growth, stress, and hardness of reactively sputtered tungsten nitride thin film, Surf. Coat. Technol. 205 (2010) 1953-(1961).

DOI: 10.1016/j.surfcoat.2010.08.082

[15] N. Jiang, H.J. Zhang, S.N. Bao, Y.G. Shen, Z.F. Zhou, XPS study for reactively sputtered titanium nitride thin films deposited under different substrate bias, Physica B 352 (2004) 118-126.

DOI: 10.1016/j.physb.2004.07.001

[16] G. Sato, W. Cruz, M.H. Farias, XPS, AES, and EELS characterization of nitrogen-containing thin films, J. Electron. Spectrosc. 135 (2004) 27-39.

DOI: 10.1016/j.elspec.2003.12.004

[17] M. Oring, Material Science of Thin Films, second ed., Academic Press, San Diego, (2002).

[18] S. Khamseh, Synthesis and characterization of tungsten oxynitride films deposited by reactive magnetron sputtering, J. Alloy. Compd. 611 (2014) 249-252.

DOI: 10.1016/j.jallcom.2014.05.069