GeCu/Si Bilayer Thin Film for Write-Once Blue Laser Optical Recording Media

Article Preview

Abstract:

GeCu(6 nm)/Si(6 nm) bilayer recording thin film was deposited on nature oxidized silicon wafer and polycarbonate substrate by magnetron sputtering. The ZnS-SiO2 films were used as protective layers. We have studied the thermal property, crystallization mechanism, and recording characteristics of the GeCu/Si bilayer thin film. Thermal analysis shows that the GeCu/Si bilayer film has two reflectivity changes with the temperature ranges, 120 °C ~ 165 °C and 310 °C ~ 340 °C. The results of dynamic tests show that the optimum jitter values at recording speeds of 1X and 4X are 5.8% and 5.9%, respectively. The modulations at 1X and 4X recording speeds are all larger than 0.4.

You might also be interested in these eBooks

Info:

Periodical:

Advanced Materials Research (Volumes 123-125)

Pages:

687-690

Citation:

Online since:

August 2010

Export:

Price:

Permissions CCC:

Permissions PLS:

Сopyright:

© 2010 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation:

[1] H. Nishiwaki, K. Kitano, H. Nakjimai, E. Muramatsu, S. Taniguchi, A. Inoue, F. Yokogawa, M. Horie, K. Kiyono, T. Miyazawa and Y. Kurose: Jpn. J. Appl. Phys. Vol. 45 (2006), p.1452.

DOI: 10.1143/jjap.45.1452

Google Scholar

[2] A. E. T. Kuiper and L. van Pieterson: MRS Bull. Vol. 31 (2006), p.308.

Google Scholar

[3] Y. Kawazu, H. Kudo, S. Onari and T. Arai: Jpn. J. Appl. Phys. Vol. 29 (1990), p.2698.

Google Scholar

[4] S. W. Russel, J. Li and J. W. Mayer: J. Appl. Phys. Vol. 70 (1991), p.5153.

Google Scholar

[5] B. Bian, J. Yie, B. Li and Z. Wu: J. Appl. Phys. Vol. 73 (1991), p.7402.

Google Scholar

[6] J. B. Lee, C. J. Lee and D. K. Cho: Jpn. J. Appl. Phys. Vol. 40 (2001), p.6177.

Google Scholar

[7] H. Inoue, K. Mishima, M. Aoshima, H. Hirata, T. Kato and H. Utsunomiua: Jpn. J. Appl. Phys. Vol. 42 (2003), p.1059.

Google Scholar

[8] Y. C. Her and C. W. Chen: J. Appl. Phys. Vol. 101 (2007), p.043518.

Google Scholar

[9] Y. C. Her, S.T. Jean and J.L. Wu: J. Appl. Phys. Vol. 102 (2007), p.093503.

Google Scholar

[10] P. Germain, S. Squelard, J. Bourgoin and A. Gheorghiu: Appl. Phys. (Berl. ) Vol. 48 (1977), p. (1909).

Google Scholar

[11] T. H. Wu, P. C. Kuo, Y. H. Fang, J. P. Chen, P. F. Yen, T. R. Jeng, C. Y. Wu and D. R. Huang: Appl. Phys. Lett. Vol. 90 (2007), p.151111.

Google Scholar

[12] T. H. Wu, P. C. Kuo, E. F. Tsai, D. Y. Chiang, W. T. Tang, T. R. Jeng, R. P. Cheng, W. C. Hsu, D. R. Huang and S. C. Chen: IEEE. Trans. Magn. Vol. 43 (2007), p.856.

Google Scholar

[13] E. Garcı´a Garcı´a, A. Mendoza Galva´n, G. Martı´nez, Y. Vorobiev, E. Morales Sa´nchez, B.S. Chao and J. Gonza´lez Herna´ndez: J. Vac. Sci. Technol. Vol. A 17 (1999), p.1805.

DOI: 10.1201/b11988-11

Google Scholar

[14] H. E. Kissinger: Anal. Chem. Vol. 29 (1957), p.1702.

Google Scholar