Investigation of Grinding Process Simulation

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Abstract:

Computer simulation is an important method to research the grinding mechanism and optimize the grinding process parameters. Especially in recent years as the development of computer calculation speed, the improvement of computer graphics theory and the gradual maturity of artificial intelligence technology, experts and scholars whose research subject related grinding had done a lot of work on grinding simulation. This paper describes the main contents grinding of the grinding simulation research work made in recent years. Include some of the key research results of the present grinding simulation, the major difficulties in grinding simulation and the research trends are summarized in this paper.

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Advanced Materials Research (Volumes 126-128)

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119-124

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August 2010

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© 2010 Trans Tech Publications Ltd. All Rights Reserved

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[1] R.M. Baul, R. Shilton: Proc. 8th Int. MTDR Conf Vol. 8 (1967), p.923.

Google Scholar

[2] T. Suto, T. Sata: Journal of the Japan Society of Precision Engineering Vol. 45 (1979), p.554.

Google Scholar

[3] T. Suto, T. Sata: Bulletin of the Japan Society of Precision Engineering Vol. 15(1981), p.27.

Google Scholar

[4] K. Steffens, W. Konig: Ann CIRP Vol. 32(1983), p.255.

Google Scholar

[5] P. Koshy, J.K. Jain and G.K. Lal: International Journal of Machine Tools and Manufacture Vol. 37 (1997), p.751.

Google Scholar

[6] J.B. Hegeman: Fundamentals of Grinding: Surface Conditions of Ground Materials (Ph.D. University of Groningen, Netherlands 2000).

Google Scholar

[7] X. Chenand, W, B, Rowe: International Journal of Machine Tools and Manufacture Vol. 36 (1996), p.871.

Google Scholar

[8] Zhong Shao: Virtual Technology Application in Grinding (Dissertation Northeastern University, Shenyang 2002).

Google Scholar

[9] Gong Yadong, Shao Zhong and Wang Wanshan: Machinery Design & Manufacture Vol. 6 (2002), p.18.

Google Scholar

[10] W. Cooper, A.S. Lavine: Journal of Manufacturing Science and Engineering Vol. 122 (2000), p.59.

Google Scholar

[11] T.A. Nguyen, D.L. Butler: International Journal of Machine Tools & Manufacture Vol. 45 (2005), p.1321.

Google Scholar

[12] T.J. Chuang, Z.D. Wang, M. Hill and G. White: Fracture Mechanics of Ceramics-Fatigue, Composites, and High-Temperature Behavior Vol. 12 (1996), p.135.

Google Scholar

[13] Amit M. Wani, Vinod Yadava and Atul Khatri: Journal of Materials Processing Technology Vol. 1-3 (2007), p.282.

Google Scholar

[14] Su Chong: Research on Key Theories and Technologies of Virtual Grinding (Ph.D. Northeastern University, Shenyang 2009).

Google Scholar

[15] I.F. Stowers, R. Komanduri and E.D. Baird. Proceeding of the SPIE, San Diego Vol. 966 (1989), p.62.

Google Scholar

[16] I.F. Belak, W.G. Hoove, C.G. Hoover, et al.: Thrust Area Reps Vol. 89 (1990), p.4.

Google Scholar

[17] J. Belak, D.B. Boercker and Stower : MRS Bulletin Vol. 18 (1993), p.55.

Google Scholar

[18] J. Belak, J.N. Glosli, D.B. Boercker and I.F. Stower: Mat. Res. Soc. Symp Vol. 389 (1995), p.181.

Google Scholar

[19] N. Ikawa, S. Shinada, and H. Tanaka: Nanotechnology Vol. 3 (1992), p.6.

Google Scholar

[20] T. Inamura, H. Suzuki and N. Takezawa: Journal of the Japan Society of Precision Engineering Vol. 56 (1990), p.1480.

Google Scholar

[21] Rudiger Rentsch, Lchiro Lnasaki: Annals of the CIRP Vol. 44 (1995), p.295.

Google Scholar

[22] Shimizu Jun, Zhou Libo and EDA Hiroshi: Proceedings of the 10th International Manufacturing Conference Paper Vol. 10 (2002), p.8.

Google Scholar

[23] Lin Bin, HAN Xuesong, Yu Siyuan and Chen Xi rang: Journal of Tianjing University (Science and Technology) Vol. 33 (2000), p.652.

Google Scholar

[24] Lin Bin, Wu Hui, Yu Siyuan and Xu Yanshen: Nanotechnology and Precision Engineering Vol. 2 (2004), p.136.

Google Scholar

[25] Guo Xiaoguang, Guo Dongming, Kang Renke and Jin Zhuji: Journal of Semiconductors Vol. 29 (2008), p.1180.

Google Scholar