A Study on Pressure Stability in Double-Sided Polishing Process

Abstract:

How to achieve the precision double-sided polishing process is a important issue for wafer manufacturing, it depends on machining condition such as machining environment, polishing speed, polishing operation mode, polishing pressure, polishing fluid etc. The key factor to the wafer surface quality is the stability of the polishing pressure. This paper analyzes the impact of double-sided polishing pressure in polishing process, using AMESim software to simulate the pressure standard deviation’s changes under diffrent polishing pressures, and carries out some experiments to identify the impact of polishing parameters (such as the ring gear ratio, polishing speed, polishing pressure) to the polishing pressure stability and the wafer surface quality.

• Periodical: Advanced Materials Research (Volumes 126-128)
• Pages: 64-69
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.126-128.64
• Online since: August 2010
• Authors: Wei Li, Cheng Jin, Xiao Zhen Hu
• Keywords: Double-Sided Polishing Process, Polishing Pressure Stability, Pressure Standard Deviation

References

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