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The Research of Modulation Period on Photoelectric Properties of Ti/TiN Multilayer Films

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Abstract:

A series of Ti/TiN multilayer films were prepared by reactive DC magnetron sputtering onto Si(111) substrates. The resistivity and optical reflectance of these thin films were measured as a function of the modulated, multilayered thickness and the number of layered structures. The resistivity decreased with increase in the number of layers in the film up to 4 layers. The reflectance in the near infrared region increased with increase in layer thickness but after a certain thickness, the change in reflectance was minimal. An optimum thickness of 25 nm for the modulated film realized a maximum of 0.829 in the near infrared reflectance. With the number of layers greater than 15, an interfacial layer of Ti2N was observed.

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Advances in Abrasive Technology XIII View Preview

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Periodical:

Advanced Materials Research (Volumes 126-128)

Pages:

935-939

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.126-128.935

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Cite this paper

Online since:

August 2010

Authors:

Min Hu, Ying Liu

Keywords:

Magnetron Sputtering, Modulation Period, Reflectivity, Sheet Resistance, Ti/Tin Multilayer Film

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© 2010 Trans Tech Publications Ltd. All Rights Reserved

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