Influence of Substrate Temperature on Structure and Optical Property of Cu3N Thin Films

Abstract:

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Copper nitride thin films were prepared by reactive radio frequency magnetron sputtering at various substrate temperatures. The surface morphology and crystal structure of the thin films were characterized by atomic force microscope (AFM) and X-ray diffraction (XRD), respectively. The AFM images demonstrate that the films have a compact structure. The XRD test indicates that growth orientation of the thin films prefers the (111) or (100) at different substrate temperature. The optical transmission properties of the thin films were obtained by an ultraviolet visible spectrometer. The optical band gap of the thin films decreases with increasing substrate temperature.

Info:

Periodical:

Advanced Materials Research (Volumes 152-153)

Edited by:

Zhengyi Jiang, Jingtao Han and Xianghua Liu

Pages:

218-221

DOI:

10.4028/www.scientific.net/AMR.152-153.218

Citation:

J. R. Xiao et al., "Influence of Substrate Temperature on Structure and Optical Property of Cu3N Thin Films", Advanced Materials Research, Vols. 152-153, pp. 218-221, 2011

Online since:

October 2010

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Price:

$35.00

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