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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 160-162Study on Bombardment Energy of Substrate Surface...

Study on Bombardment Energy of Substrate Surface in Sputtering Environment by Langmuir Probe

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Abstract:

Based on deposition rate of coatings and ion flux measured by Langmuir probe in sputtering environment, bombardment energy Ec1 of sputtered neutral atoms and bombardment energy Ec2 of bombardment ions accepted by substrate surface micro-area per unit time were calculated. The magnitude of Ec1 and Ec2 was approximately the same, surface diffusing processes of the top layer atoms in the coating were accelerated by the simultaneity action of Ec1 and Ec2, bulk diffusion processes of the atoms under the top layer in the coating were promoted by energy accumulation and temperature rise effect caused by the continuance action of Ec1 and Ec2.

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Materials Science and Engineering Applications

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Periodical:

Advanced Materials Research (Volumes 160-162)

Pages:

1839-1844

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.160-162.1839

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Online since:

November 2010

Authors:

Hong Tao Li, Bai Ling Jiang, Bo Yang, Zheng Cao

Keywords:

Bombardment Energy, Langmuir Probe, Micromorphology, Sputtering, Target Voltage

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© 2011 Trans Tech Publications Ltd. All Rights Reserved

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