Characterization of Fluoro-Doped Tin Oxide Films Prepared by Newly Approached of Inkjet Printing Methods

Abstract:

A comparison study on deposition temperature between 40oC and 60oC using new route coating which is inkjet printing technique have been studied in this research paper. The FTO material were prepared by a common mixture technique between precursor solution of SnCl4.5H2O and NH4F as a doping agent. The prepared samples were coated on the glass substrate sized 20mm x 25mm and were calcined at 450oC. The samples were characterized using XRD, XPS, VP-SEM and UV-VIS. From the VP-SEM, the result show the different surface morphology between the two deposition temperatures. Samples prepared at 60oC shows a lot existence some kind of crystal shape on the substrate compared to films deposited at 40oC. Surface studies using XPS technique shows the existence of elements such as Sn, O and F. Detail analysis of these elements shows that Sn 3d5/2 form as Sn-O, O1s as oxygen linkage and F1s as Sn-F. The XPS and XRD results also shows that no significant changes on chemical stoichiometry for both deposition temperatures. The optimum optical properties with lower resistivity were found for thin films deposited at 40oC with 91 %T and 16 Ω/□.

• Periodical: Advanced Materials Research (Volume 173)
• Pages: 128-133
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.173.128
• Online since: December 2010
• Authors: Wan Zurina Samad, Mohd Ambar Yarmo, Muhamad Mat Salleh
• Keywords: Fluoro Doped Tin Oxide, Inkjet Printing, Spin Coating, Thin Film, Transparent Conducting Oxide (TCO)

References

[1] C. H. Han, S. D. Han, J. Gwak, & S. P. Khatkar. Materials Letters 61 (2007), p.1701.

[2] B. Russo, & G. Z. Cao. Applied Physics A 90 (2008), p.311.

[3] D. Li, H. Haneda, S. Hishita, N. Ohashi, N. K. Labhsetwar. Journal of Fluorine Chemistry Vol. 126 (2004), p.69.

[4] A. V. Moholkar, S. M. Pawar, K. Y. Rajpure, & C. H. Bhosale. Materials Letters 61 (2007), p.3030.

[5] A. I. Martinez, L. Huerta, J. M. O. Rueda de Leon, D. Acosta, O. Malik, & M. Aguilar. Journal of Physic D: Applied Physics 39 (2006), p.5091.

[6] F. M. Amanullah, K. J. Pratap, & V. Hari Babu. Materials Science & Engineering B52 (1998), p.93.

[7] S. Shanti, C. Subramaniam, & P. Ramasamy. Materials Science and Engineering B57 (1999), p.127.

[8] J. F. Moulder, W. F. Stickle, P. E. Sobol, & K. D. Bomben. Handbook of X-ray Photoelectron Specstroscopy. Perkin Elmer Corporation. October (1992).

[9] N. Tsud,V. Johanek, I. Stara, K. Veltruska, V. Matolin. Journal of Thin Solid Films 391 (2001), p.204.

[10] X. Zhou, M. Pfeiffer, J. Blochwitz, A. Werner, A. Nollau, T. fritz, and K. Leo, Appl. Phys. Let Vol. 78 (2001), p.410.

[11] K. K. Purushothaman, M. Dhanashankar, & G. Muralidharan. Current Applied Physics (2008).

[12] E. Elangovan, & K. Ramamurthi, K. Thin solid films 476 (2005), p.231.