Simulation for Aberration of Chromium Atomic Beam Focusing and Deposition

Wen Tao Zhang; Jing Huang; Bao Hu Zhu; Yuan Yuan Wu; Xi Huang

doi:10.4028/www.scientific.net/AMR.189-193.4191

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 189-193Simulation for Aberration of Chromium Atomic Beam...

Simulation for Aberration of Chromium Atomic Beam Focusing and Deposition

Abstract:

The image distortion which comes from aberration is analyzed and the effects on focal line features are also discussed, which are resulted from the spherical aberration, chromatic aberration and beam spread. The simulation results have show that source imperfection, especially the transverse velocity spread, plays a critical role in broadening the feature width.

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Periodical:

Advanced Materials Research (Volumes 189-193)

Pages:

4191-4194

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.189-193.4191

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Online since:

February 2011

Authors:

Wen Tao Zhang, Jing Huang, Bao Hu Zhu, Yuan Yuan Wu, Xi Huang

Keywords:

Aberration, Atom Lithography, Deposition, Nanometer Fabrication

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