Study on Low Temperature Deposition of TiN Films and their Tribological Properties

Abstract:

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The low temperature deposition principle of magnetron sputtering was discussed. Reactive magnetron sputtering technique was used to gain titanium nitride (TiN) thin films on W18Cr4V high-speed steel substrates at low temperature. A series of experiments had been conducted to study the properties of TiN films. The experimental results showed that at the low temperature(<140 °C), magnetic sputtering can be used for the deposition of TiN film with compact, uniform and high nano-hardness, and their tribological properties were excellent, which co-determined by the film structure of low temperature magnetron sputtering and the counter-parts of rubbing pairs.

Info:

Periodical:

Advanced Materials Research (Volumes 189-193)

Edited by:

Zhengyi Jiang, Shanqing Li, Jianmin Zeng, Xiaoping Liao and Daoguo Yang

Pages:

925-930

DOI:

10.4028/www.scientific.net/AMR.189-193.925

Citation:

X. Q. Bai and J. Li, "Study on Low Temperature Deposition of TiN Films and their Tribological Properties", Advanced Materials Research, Vols. 189-193, pp. 925-930, 2011

Online since:

February 2011

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$35.00

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