Study on Low Temperature Deposition of TiN Films and their Tribological Properties

Xiu Qin Bai; Jian Li

doi:10.4028/www.scientific.net/AMR.189-193.925

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 189-193Study on Low Temperature Deposition of TiN Films...

Study on Low Temperature Deposition of TiN Films and their Tribological Properties

Abstract:

The low temperature deposition principle of magnetron sputtering was discussed. Reactive magnetron sputtering technique was used to gain titanium nitride (TiN) thin films on W18Cr4V high-speed steel substrates at low temperature. A series of experiments had been conducted to study the properties of TiN films. The experimental results showed that at the low temperature(<140 °C), magnetic sputtering can be used for the deposition of TiN film with compact, uniform and high nano-hardness, and their tribological properties were excellent, which co-determined by the film structure of low temperature magnetron sputtering and the counter-parts of rubbing pairs.

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Periodical:

Advanced Materials Research (Volumes 189-193)

Pages:

925-930

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.189-193.925

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Online since:

February 2011

Authors:

Xiu Qin Bai, Jian Li

Keywords:

Low Temperature Deposition, Magnetic Sputtering, TiN Film, Tribological Property

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DOI: 10.1016/s0040-6090(98)01134-1

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