Molecular Dynamics Simulations of Structures of Amorphous Carbon Films via Deposition

Abstract:

The growth of amorphous carbon films via deposition is investigated using molecular dynamics simulation with a modified Tersoff potential. The impact energy of carbon atoms ranges from 1 to 50 eV and the temperature of the diamond substrate is 300 K. The effects of the incident energy on the growth dynamics and film structure are studied in a detail. Simulation results show that the mobility of surface atoms in the cascade region is enhanced by impacting energetic carbon ions, especially at moderate energy, which favors the growth of denser and smoother films with better adhesion to the substrate. Our results agree qualitatively with the experimental observation.

• Periodical: Advanced Materials Research (Volumes 194-196)
• Pages: 2220-2224
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.194-196.2220
• Online since: February 2011
• Authors: Hui Qing Lan, Zheng Ling Kang
• Keywords: Amorphous Carbon Film, Deposition, Molecular Dynamic Simulation, Structure

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