Models and Simulations of the UV Lithography Process Based on Thick Photoresists

Abstract:

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This paper presents the models for the ultraviolet (UV) lithography of thick photoresists such as thick SU-8. Simulations for various lithography conditions have been conducted using these models based on the improved dynamical cellular automata method. Some experiments on SU-8 2075 layers under UV source with 365nm wavelength have been implemented to verify the simulation results. The results confirm the validity of the proposed models.

Info:

Periodical:

Advanced Materials Research (Volumes 201-203)

Edited by:

Daoguo Yang, Tianlong Gu, Huaiying Zhou, Jianmin Zeng and Zhengyi Jiang

Pages:

75-79

DOI:

10.4028/www.scientific.net/AMR.201-203.75

Citation:

Z. F. Zhou et al., "Models and Simulations of the UV Lithography Process Based on Thick Photoresists", Advanced Materials Research, Vols. 201-203, pp. 75-79, 2011

Online since:

February 2011

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Price:

$35.00

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