Models and Simulations of the UV Lithography Process Based on Thick Photoresists
This paper presents the models for the ultraviolet (UV) lithography of thick photoresists such as thick SU-8. Simulations for various lithography conditions have been conducted using these models based on the improved dynamical cellular automata method. Some experiments on SU-8 2075 layers under UV source with 365nm wavelength have been implemented to verify the simulation results. The results confirm the validity of the proposed models.
Daoguo Yang, Tianlong Gu, Huaiying Zhou, Jianmin Zeng and Zhengyi Jiang
Z. F. Zhou et al., "Models and Simulations of the UV Lithography Process Based on Thick Photoresists", Advanced Materials Research, Vols. 201-203, pp. 75-79, 2011