A Feature-Based CAD-CAE Integrated Approach of Machine Tool and its Implementation
p.54
p.54
Using Software Engineering to Guide Commercial CAD Software Secondary Development
p.59
p.59
Research on 3D Non-Destructive Measurement System Based on Homogeneous Entity
p.63
p.63
Study on the Parallel Rendering Technology Used in Virtual Prototype System
p.69
p.69
Models and Simulations of the UV Lithography Process Based on Thick Photoresists
p.75
p.75
Research on Computer-Aided Conceptual Design of Palletizing Robot
p.80
p.80
Study on the Computer Numerical Control Process of Variable Pitch, Groove Depth and Groove Width Screw
p.85
p.85
Numerical Simulation on Aerodynamics of Ramjet Projectiles
p.89
p.89
A Parametric Die-Base in SolidWorks
p.93
p.93
Models and Simulations of the UV Lithography Process Based on Thick Photoresists
Abstract:
This paper presents the models for the ultraviolet (UV) lithography of thick photoresists such as thick SU-8. Simulations for various lithography conditions have been conducted using these models based on the improved dynamical cellular automata method. Some experiments on SU-8 2075 layers under UV source with 365nm wavelength have been implemented to verify the simulation results. The results confirm the validity of the proposed models.
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Periodical:
Advanced Materials Research (Volumes 201-203)
Pages:
75-79
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Online since:
February 2011
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© 2011 Trans Tech Publications Ltd. All Rights Reserved
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