Demonstration of Modification from AlF3 Re-Deposition to Polymer Re-Deposition on Air Bearing Surface (ABS) Etched Sidewall of Fluorine-Based Plasma Etch on Al2O3-TiC Substrate

Chupong Pakpum; Krisda Siangchaew; Pichet Limsuwan

doi:10.4028/www.scientific.net/AMR.213.93

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Demonstration of Modification from AlF₃ Re-Deposition to Polymer Re-Deposition on Air Bearing Surface (ABS) Etched Sidewall of Fluorine-Based Plasma Etch on Al₂O₃-TiC Substrate
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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 213Demonstration of Modification from AlF3...

Demonstration of Modification from AlF₃ Re-Deposition to Polymer Re-Deposition on Air Bearing Surface (ABS) Etched Sidewall of Fluorine-Based Plasma Etch on Al₂O₃-TiC Substrate

Abstract:

In this work, C-F polymer rich re-deposition are generated on the etched side wall of the patterned Air Bearing Surface (ABS). This C-F rich polymer is a by product from using a Surface Technology Systems Multiplex-Pro Air Bearing Etch (ABE) tool that utilizes fluorine base plasma. The morphology of the re-deposition and elemental composition are investigated via scanning electron microscope. The chemical bonding information is characterized via attenuated total reflected infrared spectroscopy. The purpose of this work is to demonstrate the modification of AlF3 re-deposition to polymer rich re-deposition allows complete re-deposition removal with isopropyl alcohol base solution. This offers advantage as the re-deposition removal is incorporated during the resist strip process offering superior cleanliness of slider head without additional process steps.

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Periodical:

Advanced Materials Research (Volume 213)

Pages:

93-97

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.213.93

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Online since:

February 2011

Authors:

Chupong Pakpum, Krisda Siangchaew, Pichet Limsuwan

Keywords:

Al₂O₃-TiC, Fluorine Base Plasma, Polymer Re-Deposition, RIE Etching

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