With the development of economy and society, more and more energy is needed to meet the requirement of industries and social life. It is necessary to find new types of energy that is clear, high effective and non-polluted. Although wet etching is widely used in industries to prepare the silicon surface texture, the etching process is stochastic and the influence light trapping. Many efforts have been made such as adjusting the proportion of different acids, to improve the quality of silicon surface by wet etching, the result does not meet the ideal requirement by now. In this paper, a new approach is presented to prepare the surface texturing. By combining wet etching and ultrasonic vibration, the sodium or acid molecular motion can be controlled, and the pyramid structure in silicon surface can be made regular.