Research on the Preparation Methods of Silicon Oxide Thin Films

Abstract:

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Silicon oxide thin films have many excellent properties such as hardness, optical,dielectric properties,wear-resistance and corrosion-resistance. It has been widely used in optical and microelectronic applications. The preparation methods mainly include phsical vapor deposition and chemical vapor deposition.The paper reviews a few preparation methods of silicon oxide thin films, and compares advantages and disadvantages w ith each other. On the other hand,it point out the tendency of development.

Info:

Periodical:

Advanced Materials Research (Volumes 233-235)

Edited by:

Zhong Cao, Lixian Sun, Xueqiang Cao, Yinghe He

Pages:

2556-2560

DOI:

10.4028/www.scientific.net/AMR.233-235.2556

Citation:

C. W. Li et al., "Research on the Preparation Methods of Silicon Oxide Thin Films", Advanced Materials Research, Vols. 233-235, pp. 2556-2560, 2011

Online since:

May 2011

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Price:

$35.00

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