Research on the Preparation Methods of Silicon Oxide Thin Films

Abstract:

Silicon oxide thin films have many excellent properties such as hardness, optical,dielectric properties,wear-resistance and corrosion-resistance. It has been widely used in optical and microelectronic applications. The preparation methods mainly include phsical vapor deposition and chemical vapor deposition.The paper reviews a few preparation methods of silicon oxide thin films, and compares advantages and disadvantages w ith each other. On the other hand,it point out the tendency of development.

• Periodical: Advanced Materials Research (Volumes 233-235)
• Pages: 2556-2560
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.233-235.2556
• Online since: May 2011
• Authors: Chun Wei Li, Qun Li Zhang, Shu Yan Xu, Gui Ying Wang
• Keywords: Fabrication Method, Silicon Oxide, Thin Film

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