Effects of Atomic Oxygen Irradiation on PDMS/POSS Hybrid Films in Low Earth Orbit Environment

Mi Mi Song; Shu Wang Duo; Ting Zhi Liu

doi:10.4028/www.scientific.net/AMR.239-242.1368

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 239-242Effects of Atomic Oxygen Irradiation on PDMS/POSS...

Effects of Atomic Oxygen Irradiation on PDMS/POSS Hybrid Films in Low Earth Orbit Environment

Abstract:

In order to improve the atomic oxygen (AO) erosion resistance of polyimide films in low earth orbit space environment, a type PDMS/POSS hybrid coating on polyimide substrate was prepared based on a silanol terminated polydimethylsiloxane (PDMS-OH) and Octakis(trimethylsiloxy)octaprismosilsesquioxane (Q₈[Si(CH₃)₃]₈) by copolymerizing process in DMAc solution. The atomic oxygen exposure tests were carried out using a ground-based atomic oxygen simulation facility. The mass loss, surface morphology and surface chemical compositions of PDMS/POSS hybrid films before and after exposure to incremental AO flux were investigated by using microbalance and field emission scanning electron microscopy (FE-SEM) and X-ray photoelectron spectroscopy (XPS), respectively. The data indicated that a silica-rich layer was formed on the surface of the hybrid coating when the coating is exposed to AO flux, which could provide a protective barrier on the surface preventing further degradation of the polymer during extended exposure to AO and obviously improved the AO resistance of polyimide films.

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Periodical:

Advanced Materials Research (Volumes 239-242)

Pages:

1368-1371

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.239-242.1368

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Online since:

May 2011

Authors:

Mi Mi Song, Shu Wang Duo, Ting Zhi Liu

Keywords:

Atomic Oxygen, Erosion, Hybrid Films, POSS

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