Transparent Conductive Cu-In-O Thin Films Deposited by Reactive DC Magnetron Sputtering with Different Targets

Abstract:

Transparent conductive Cu-In-O thin films were deposited by reactive DC magnetron sputtering. Two types of targets were used. The first was In target covered with a fan-shaped Cu plate of the same radius and the second was Cu target on which six In grains of 1.5mm was placed with equal distance between each other. The samples were characterized with scanning electron microscopy (SEM), energy dispersive X-ray spectroscopy (EDX), X-ray diffraction (XRD), UV/VIS spectrophotometer, four-probe measurement etc. SEM shows that the surfaces of all the samples are very smooth. EDX shows that the samples contain Cu, In as well as O, and different targets result in different atomic ratios of Cu to In. A diffraction peak related to rhombohedra-centered In₂O₃ (012) is observed in the XRD spectra of all the samples. For both the two targets, the transmittance decreases with the increase of O₂ flow rates. The direct optical band gap of all the samples is also estimated according to the transmittance curve. For both the two targets, different O₂ flow rates result in different sheet resistances and conductivities. The target of Cu on In shows more controllability in the composition and properties of Cu-In-O films.

• Periodical: Advanced Materials Research (Volumes 239-242)
• Pages: 2752-2755
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.239-242.2752
• Online since: May 2011
• Authors: Fan Ye, Xing Min Cai, Fu Ping Dai, Dong Ping Zhang, Ping Fan, Li Jun Liu
• Keywords: Cu-In-O, Sputtering, Target, Thin Film, Tranparent Conductive Oxide

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