Zinc Oxide Thin Films Grown on Nanostructured Al Thin Layer/Glass Substrate by RF Magnetron Sputtering

Abstract:

ZnO films were deposited on nanostructured Al (n-Al) /glass substrate by RF magnetron sputtering. The results shows that the relation (I (002) /I (100) ≈ I annealed (002)/I annealed (100) ≈1.1) shows the rough n-Al surface is suitable for the growth of a-axis orientation. Meanwhile, the influences of substrate roughness, crystallinity and (101) plane of ZnO film deposited on n-Al layer have been discussed. XPS implies more oxygen atoms are bound to Aluminum atoms, which result in the increase of high metallic Zn in the film.

• Periodical: Advanced Materials Research (Volumes 239-242)
• Pages: 777-780
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.239-242.777
• Online since: May 2011
• Authors: Ting Zhi Liu, Shu Wang Duo, C Y Hu, C B Li
• Keywords: Crystal Structure, Deposition, Thin Film, Zinc Oxide (ZnO)

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