A Study on the Photolysis Behavior of Photoacid Generators

Wei Min Zhang; Wen Guang Wang; Jia Ling Pu

doi:10.4028/www.scientific.net/AMR.284-286.2073

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 284-286A Study on the Photolysis Behavior of Photoacid...

A Study on the Photolysis Behavior of Photoacid Generators

Abstract:

A method for evaluating the photolysis behavior of photoacid generator in solvent and high polymer film has been established through spectrophotometry and fluorospectrophotometry by using the acid-sensitive Rhodamine B as tracer. Results showed that this method is feasible and practicable for evaluating the acid generating efficiency of photoacid generator in organic solvents or polymer film, yielding quantitatively precise data of the photochemical reaction and acid generating behavior, thus is very useful for evaluating the quality of different types of photacid generators e.g. triazines, sulfonium salts etc.

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Periodical:

Advanced Materials Research (Volumes 284-286)

Pages:

2073-2076

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.284-286.2073

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Online since:

July 2011

Authors:

Wei Min Zhang, Wen Guang Wang, Jia Ling Pu

Keywords:

Acid Generating Efficiency, Photoacid Generator, Photolysis

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