Research on Output Power of Plasma for PCVD Synthesizing Silica Glass

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Abstract:

Super purity silica glass was synthesized by Plasma Chemical Vapor Deposition (PCVD) method, during which inductively coupled plasma was used as the heat source. Influence of structure factor of tube and working gas on output power were discussed. The structure factor of tube was confirmed by analyzing the relation between structure factor of tube and coupling efficiency. With the increase of coupling efficiency, output power and plasma radius grow bigger. Super purity silica glass can be successfully synthesized when air was used working gas, during which input power was 100kW and output power reached to 40kW.

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Periodical:

Advanced Materials Research (Volumes 291-294)

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3009-3012

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Online since:

July 2011

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© 2011 Trans Tech Publications Ltd. All Rights Reserved

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[1] X.F. Song, Y.C. Sun, H. Zhong, Z.A. Gu: Synthesis of Silica Glass by Plasma Chemical Vapor Deposition Method. Journal of the Chinese ceramic society. 2008,36(4):531-534.

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[2] Y.F. Wang, H. Zhong, X.F. Song, C.D. Rao, X.B. Song, Z.A. Gu: A Method of Vapor Synthesizing Silica Glass with High Frequency Plasma. CN Patent, 1699232, 2005.

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[3] Mensing, A.E. and Boedeker, L.R:Theoretical investigations of R.F. induction heated plasmas. NASA. 1969:l3l2.

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