Preparation and Characteristics of Nanocrystalline Diamond Film by Using of MPVCD

Article Preview

Abstract:

With the microwave plasma chemical vapor deposition (MPCVD), the effects of the deposition pressure and the different substrate temperature on diamond coating on single crystal silicon substrate were studied systemically. The sample was characterized by means of scanning electron microscopy (SEM) and laser Raman spectra (Raman). The experimental results showed that the surface of the film was compact, the mean particle diameter was 98nm, and that it contains the sp3 carbon phase with good quality.

You might also be interested in these eBooks

Info:

Periodical:

Pages:

1-5

Citation:

Online since:

July 2011

Export:

Price:

Permissions CCC:

Permissions PLS:

Сopyright:

© 2011 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation:

[1] Coe S E, Sussmann R S. Thermal and Mechanical Propertyes of CVD Diamond, Diamond and Related Materials. Optical[J]. 2000, 9: 1762~1729.

DOI: 10.1016/s0925-9635(00)00298-3

Google Scholar

[2] K. Kitahama, K Hirata, Buchkremer Hermanns H. et al. Synthesis of diamond by laser induced chemical vapor deposition. A ppl. Phys. Lett. [J]. 1986, 49(11): 634~645.

DOI: 10.1063/1.97063

Google Scholar

[3] DERJAGUIN B V, FEDASEEV D B. The synthesis of diamond at low pressure. Sci Am, [J]. 1975, 233(5): 102~105.

Google Scholar

[4] J. -T. Wang, J. -O. Carlsson, A thermo chemical model for diamond growth from the vapor phase. Surf And Coat. Tech. [J]. 1990. 43:44~46.

Google Scholar

[5] Yang Bao-hua, Xiong Yong, Wang Hong-yan, Growth, Characteristics and Field Emitter Property of Diamond Films[J]. Journal of Yunnan University of China(Natural Sciences Edition), 2010, 32, (4): 424-428.

Google Scholar

[6] R. -J. Schirach, B. O. Kolbesen, D. D. Aderhold etc, Characterization of crystal faces of polycrystalline HFCVD diamond films by STM/STS[J]. Fresenius J Anal Chem, 1997, 358: 335-338.

DOI: 10.1007/s002160050422

Google Scholar

[7] Randell Mills, Jayasree Sankar, Andreas Voigt, et al. Role of atomic hydrogen density and energy in low power chemical vapor deposition synthesis of diamond films[J]. Thin Solid Film, 2005, 478: 77-90.

DOI: 10.1016/j.tsf.2004.10.009

Google Scholar

[8] Michael E. Coltrin, David S. Dandy, Analysis of diamond growth in subatmospheric dc plasma-gun reactors. J. Appl. Phys[J]. Vol. 2009, 74(9): 5803~5820.

DOI: 10.1063/1.354201

Google Scholar

[9] P. Keblinski,D. Wolf,F. Cleri, et al. On the nature of grain boundaries in nanocrystalline diamond [J]. Materials Research Socity Bulltin, 1998, 23(9): 36-41.

DOI: 10.1557/s0883769400029353

Google Scholar

[10] D.S. Knigh,W. B White. Characterization of diamond films by Raman spectroscopy[J]. Materical Research. 1989, (4): 385-393.

Google Scholar

[11] Joungchel Lee R.W. Collins, and R. Messier. Low temperature plasma process based on CO-rich CO/H2 mixtures for high rate diamond film deposition[J]. Applied Physical Letter, 1997, 70(12): 1527-1529.

DOI: 10.1063/1.118607

Google Scholar

[12] B. Marcus,L. Fayette, Mermoux, et al. Analysis of the structure of multi-component carbon films by resonant Raman scattering[J]. Journal of Applied Physics, 1994, 76(6): 3463-3470.

DOI: 10.1063/1.357476

Google Scholar

[13] E.J. Corat and D.G. Goodwin. Temperature dependence of species concentrations near the substrate during diamond chemical vapor deposition. Journal of Applied Physics[J]. 1993, 72 (3): 2021-(2029).

DOI: 10.1063/1.354765

Google Scholar