Preparation and Characteristics of Nanocrystalline Diamond Film by Using of MPVCD
With the microwave plasma chemical vapor deposition (MPCVD), the effects of the deposition pressure and the different substrate temperature on diamond coating on single crystal silicon substrate were studied systemically. The sample was characterized by means of scanning electron microscopy (SEM) and laser Raman spectra (Raman). The experimental results showed that the surface of the film was compact, the mean particle diameter was 98nm, and that it contains the sp3 carbon phase with good quality.
B. H. Yang et al., "Preparation and Characteristics of Nanocrystalline Diamond Film by Using of MPVCD", Advanced Materials Research, Vol. 304, pp. 1-5, 2011