The Effects of Magnetic Field on the Deposited Performance of CrN Films by Magnetron Sputtering

Ming Der Jean; Ming Tsong Chou

doi:10.4028/www.scientific.net/AMR.311-313.1340

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 311-313The Effects of Magnetic Field on the Deposited...

The Effects of Magnetic Field on the Deposited Performance of CrN Films by Magnetron Sputtering

Abstract:

This paper reports the effects of varying magnetic field strength on CrN films, deposited by a magnetic sputtering process. The strength of magnetic field in unbalanced magnetic sputtering processes is controlled by adjusting the gap distance between the magnet set and the target surface (GDMT). An improvement in overall intensity, at low GDMT, was observed by adjustable magnetic field distributions. In the chamber, it was readily noticeable that varying the magnetic field strength has an influence on the CrN structures. In experiments, at low GDMT, a high hardness value and lower wear rate become visible in the CrN films. In addition, the CrN films formed have a smooth surface with a dense tiny structure and display preferential orientation in the Cr2N(111) and Cr2N(002) planes, whereas CrN films prepared at higher GDMT exhibit more roughness and the CrN (200) plane is evident. Furthermore, the Cr2N (111) (002) plane possessed better tribological properties than that of the CrN(200) plane, where the wear scars show little failures on the coating surface.

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Periodical:

Advanced Materials Research (Volumes 311-313)

Pages:

1340-1347

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.311-313.1340

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Online since:

August 2011

Authors:

Ming Der Jean, Ming Tsong Chou

Keywords:

Chromium Nitride, Magnetic Field Distribution, Unbalanced Magnetron Sputtering, Wear Rate

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