Dependence of Hysteresis Loops on Thickness of Thin Nickel Films Prepared by RF Sputtering

Watcharee Rattanasakulthong; Pichai Sirisangsawang; Supree Pinitsoontorn; Chitnarong Sirisathitkul

doi:10.4028/www.scientific.net/AMR.335-336.1443

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 335-336Dependence of Hysteresis Loops on Thickness of...

Dependence of Hysteresis Loops on Thickness of Thin Nickel Films Prepared by RF Sputtering

Abstract:

Nickel films of varying thicknesses between 70 and 300 nm were deposited on glass substrates by RF sputtering and their broad (111) FCC peaks were identified by X-ray diffraction. The surface roughness and sub-micron grains were revealed by scanning electron microscopy. According to vibrating sample magnetometry, the films showed hysteresis loops with comparable coercive field and saturation field for the in-plane and perpendicular magnetizations. The increase in thickness substantially increased the magnetization and the squareness of the Ni films. The thickness can be classified into 2 regimes by the variation of squareness. The films are thinner than 200 nm showed the in-plane anisotropy whereas the perpendicular anisotropy was developed in the case of the thickness above 200 nm.

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Periodical:

Advanced Materials Research (Volumes 335-336)

Pages:

1443-1447

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.335-336.1443

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Online since:

September 2011

Authors:

Watcharee Rattanasakulthong, Pichai Sirisangsawang, Supree Pinitsoontorn, Chitnarong Sirisathitkul

Keywords:

Coercive Field, Ni Thin Film, RF Sputtering, Squareness, Vibrating Sample Magnetometry

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