Comparison of the Effects of Bias Voltage and Transverse Magnetic Field on the Macro-Particles Distribution on the Surface of TiN Films Prepared by Arc Ion Plating

Abstract:

The object of this article is to make research on the influence of transverse magnetic field and pulse bias on macro-particles on the surface of film, find the systematic law and analyze the influence law and reasons of the two parameters (transverse magnetic field and pulse bias), according to the mechanism of arc spot movement and the interaction between macro-particles and plasma. Moreover, this article aims at seeking the most important influence parameter and comparing the effect of the two parameters. Research in this paper indicates that: the key factor is the magnetic field controlled arc spot movement, because the influence of magnetic field on reducing macro-particles is much larger than bias, and the influence degree of bias on macro-particles varies with the magnetic field intensity; action of bias is obvious under the condition of low magnetic field intensity, but as the magnetic field intensity increases, its action becomes weaker and weaker; besides, purification effect of bias on particles in larger size is better than on particles in smaller size.

• Periodical: Advanced Materials Research (Volume 337)
• Pages: 300-306
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.337.300
• Online since: September 2011
• Authors: Wen Chang Lang
• Keywords: Arc Ion Plating (AIP), Macro-Particles (MPs), Pulsed Bias, Transverse Magnetic Field

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