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Optimization of Poly-Silicon Deposition Process for Semiconductor Bridge
Abstract:
Aiming at the severe effect of poly-silicon deposition process on the performance of semiconductor bridge, experiments were made on optimization of poly-silicon deposition to obtain optimal process conditions. Resistance of the poly-silicon semiconductor bridge was stabilized 1±0.07Ω, satisfying its application requirements.
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92-95
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September 2011
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© 2011 Trans Tech Publications Ltd. All Rights Reserved
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