Thermodynamic Study on SiHCl3 Hydrogen Reduction System in Siemens Process

Xiao Hua Yu; En He; Yan Qing Hou; Gang Xie

doi:10.4028/www.scientific.net/AMR.343-344.156

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 343-344Thermodynamic Study on SiHCl3 Hydrogen Reduction...

Thermodynamic Study on SiHCl₃ Hydrogen Reduction System in Siemens Process

Abstract:

The complex chemical reactions in the Si-Cl-H system with relation to modified Siemens process have been studied in this paper based on the thermodynamic data of related substance. The influence of the temperature, pressure and initial feed ratio (n_Si / n_SiHCl3) on the silicon yield have been studied. Furthermore, the diagram of Kinetic constant k as a function of temperature for the rate controlled reaction has also been fitted in the SiHCl3 hydrogen system. Finally 1425K, 1.5atm and the initial feed ratio of 15 is the best conditions. Under these conditions, the silicon yield is 34.815%.

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Periodical:

Advanced Materials Research (Volumes 343-344)

Pages:

156-159

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.343-344.156

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Online since:

September 2011

Authors:

Xiao Hua Yu, En He, Yan Qing Hou, Gang Xie

Keywords:

Modified Siemens Process, Poly-Silicon, Silicon Yield, Thermodynamic

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