Effect of Hydrogen on the Properties of Amorphous Carbon Nitride Films

Abstract:

The effect of hydrogen on the properties of amorphous carbon nitride films deposited onto Si substrates by magnetron sputtering device has been studied. The influence of hydrogen to roughness, porous character of films, composition and residual stress was investigated by atomic force microscopy, thermal desorption mass spectroscopy, X-ray photoelectron spectroscopy, scanning low energy electron microscopy and by goniometer equipped with Cu X-ray tube. The adding of hydrogen to nitrogen discharge a causes decrease in the high value of compressive stress (elimination of delamination of the films, increasing of nitrogen content in the bulk). On the other hand hydrogen increases roughness and porosity.

• Periodical: Advanced Materials Research (Volumes 383-390)
• Pages: 3298-3304
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.383-390.3298
• Online since: November 2011
• Authors: Eliška Mikmeková, Michal Urbánek, Tomáš Fořt, Rosa Di Mundo, Ondřej Caha
• Keywords: AFM, Hydrogenated a-CNx Films, RF Magnetron Sputtering, SLEEM, TDMS, XPS

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