Fabrication and Photocatalytic Activities of TiO₂ Nano-Films Deposited at Different Ar/O₂ Flow Ratios by DC Magnetron Sputtering

Abstract:

Polycrystalline TiO₂ nano-films were prepared by DC magnetron sputtering at different Ar/O₂ flow ratios. The thicknesses of all the prepared films were about 200 nm. The prepared films consist of a mixture of anatase and rutile phase. The TiO₂ nano-films deposited at Ar/O₂ flow ratio (1:1) have the best crystallinity and the mixture phase of anatase and rutile. SEM images show that the film surface composed of polygonal particles about 100 nm in diameter. UV–Vis transmission measurements reveal that the band gap of the deposited TiO₂ nano-films changed from 3.01 to 3.12 eV. The photocatalytic activities of the TiO₂ films were investigated by the decomposition of IPA under UV irradiation. The IPA can be oxidized to acetone and further to CO₂. The maximal acetone concentration and CO₂ concentration can reach to 29.2 ppm and 4 ppm after 120 min.

• Periodical: Advanced Materials Research (Volumes 391-392)
• Pages: 1291-1295
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.391-392.1291
• Online since: December 2011
• Authors: Peng Chen, Xin Tan, Tao Yu
• Keywords: Ar/O₂ Flow Ratios, IPA Degradation, Magnetron Sputtering, TiO₂ Nano-Films

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