Defectivity Reduction in the Silicon Tough Polishing with Polyamine and Nonions Surfactant Additives

Ming Sun; Bai Mei Tan; Xin Huan Niu; Juan Wang; Yan Gang He; Yu Ling Liu; Na Wang; Bao Hong Gao

doi:10.4028/www.scientific.net/AMR.396-398.390

Paper Titles

Growth Characteristics of AlGaN/GaN HEMTs on Patterned Si (111) Substrates Using Double AlN Interlayers by MOCVD
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Experimental Study on Heat Transfer of Bellows
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Preparation of Sulfoaluminate Cement Using Industrial Waste Residue
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Numerical Simulation Analysis for Anti-Penetration of Multilayer Ceramic Composite
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Defectivity Reduction in the Silicon Tough Polishing with Polyamine and Nonions Surfactant Additives
p.390

Influence of Inclusions in Low Alloy-Steels on Pitting Process
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Preparation and Properties of Interpenetrating Polymer Network Films from Prevulcanized Natural Rubber Latex/Chitosan Blends
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Study on Flow Friction Experimental Characteristics in Narrow Annuli
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Photodegradation of Pentachlorophenol Using NiO-Coupled NiTiO₃ Nanocomposites from Layered Precursor as Photocatalysts
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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 396-398Defectivity Reduction in the Silicon Tough...

Defectivity Reduction in the Silicon Tough Polishing with Polyamine and Nonions Surfactant Additives

Abstract:

The effects of the polyamine chelating agent and nonions surfactant additive on the surface defectivity reduction in the final polishing of the mono silicon wafers were investigated using high-purity nano colloidal silica based organic alkaline slurry. Experimental results reveal that the chemical enhanced silicon final polishing slurry containing FA/O polyamine chelating agent and FA/O nonions surfactant changed the chemistry character of silicon surface, can realize the chemical uniform etch the surface areas with defects and defect-free area, deeply lower the surface microroughness of silicon polished wafer, achieving defect-free with perfect quality of flat mirror-surface.

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Advanced Materials Research (Volumes 396-398)

Pages:

390-394

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.396-398.390

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Online since:

November 2011

Authors:

Ming Sun, Bai Mei Tan, Xin Huan Niu, Juan Wang, Yan Gang He, Yu Ling Liu, Na Wang, Bao Hong Gao

Keywords:

Defect-Free, Micro Roughness, Nonions Surfactant, Polyamine

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