Simulation and Experimental of Magnetron Sputtering Film Thickness Distribution

Jin Xin Wang; Ya Ping Han; Xue Lian Gao; Ming Hai Luo; Shao Ze Wang

doi:10.4028/www.scientific.net/AMR.399-401.1741

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 399-401Simulation and Experimental of Magnetron...

Simulation and Experimental of Magnetron Sputtering Film Thickness Distribution

Abstract:

A physical model of magnetron sputtering process was built, the distribution of film thickness on the substrate was deduced, and the data were analysised by using the Mathematica and Matlab. The results show that the distribution of the film thickness on the substrate is uneven and it is also influenced by the radius as well as the distance between the target and substrate. The results of experiment correspond fairly well with the theory. The relational expression provides a theoretical basis for evaluation and estimation of the film thickness.

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Periodical:

Advanced Materials Research (Volumes 399-401)

Pages:

1741-1745

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.399-401.1741

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Online since:

November 2011

Authors:

Jin Xin Wang, Ya Ping Han, Xue Lian Gao, Ming Hai Luo, Shao Ze Wang

Keywords:

Film Thickness Distribution, Magnetron Sputtering, Nano-Film, Physical Model, Target-Substrate Distance

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