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Electrochromic Properties and Raman Spectroscopy Analysis of Tungsten Oxide Thin Film by RF Sputter

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Abstract:

This study utilizes tungsten oxide as the research subject and investigates changes between different argon/oxygen gas flow ratio and deposits on ITO substrates through RF reactively sputtering. Propylene carbonate (PC) is further mixed with LiClO4 for the preparation of electrolyte. After packaged into components, electric voltage is applied to the films to generate reduction or oxidization, which can obtain different colored/bleached states. Lastly, Raman spectroscopy analysis is performed to get a greater understanding of electrochromic mechanisms. The results of the experiment discovered that as-deposited tungsten oxide thin film shows the formation of W+6 states, and the application of driving voltage causes the formation of W+5 states. At the same time, the thin film coloring effect appears. Increases in driving voltage cause the gradual conversion of W+ 6 states into W+5 states, which further leads to a more significant coloring effect. On the other hand, W-O-W deformed crystal lattice structures are also produced, which also affects the incidence of electrochromic property.

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Periodical:

Advanced Materials Research (Volumes 418-420)

Pages:

328-332

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.418-420.328

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Online since:

December 2011

Authors:

Chin-Pao Cheng, S.H. Lin

Keywords:

Electrochromism, Raman Spectroscopy, RF Sputtering, Tungsten Oxide

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© 2012 Trans Tech Publications Ltd. All Rights Reserved

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